Title:
METHOD FOR PRODUCING QUANTUM DOTS
Document Type and Number:
WIPO Patent Application WO/2023/182221
Kind Code:
A1
Abstract:
To provide a method for producing quantum dots having exceptional photostability by using an industrially advantageous method. Provided is a method for producing quantum dots, the method including a washing step for washing quantum dots using an organic solvent capable of dissolving impurities contained in the dispersion containing the quantum dots, and a surface protection step for adding a ligand that is a specific phosphine compound to the dispersion of washed quantum dots to protect the surface of the quantum dots using the ligand. The organic solvent in the washing step is preferably at least one selected from the group consisting of methanol, ethanol, acetone, 2-propanol, and acetonitrile.
Inventors:
SAKANOUE TOMO (JP)
NAKATSUI KAZUHIRO (JP)
SUGIYA MASASHI (JP)
NAKATSUI KAZUHIRO (JP)
SUGIYA MASASHI (JP)
Application Number:
PCT/JP2023/010652
Publication Date:
September 28, 2023
Filing Date:
March 17, 2023
Export Citation:
Assignee:
NIPPON CHEMICAL IND (JP)
International Classes:
C01B25/08; B82Y20/00; B82Y40/00; C09K11/08; C09K11/62; C09K11/70
Domestic Patent References:
| WO2020156969A1 | 2020-08-06 | |||
| WO2013035362A1 | 2013-03-14 |
Foreign References:
| JP2018141141A | 2018-09-13 | |||
| JP2018529832A | 2018-10-11 | |||
| JP2021501438A | 2021-01-14 | |||
| JP2009019067A | 2009-01-29 | |||
| JP2020502330A | 2020-01-23 |
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