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Title:
METHOD FOR PRODUCING REACTION GAS CONTAINING (E)-1,2-DIFLUOROETHYLENE
Document Type and Number:
WIPO Patent Application WO/2020/246611
Kind Code:
A1
Abstract:
The present disclosure provides a method for producing a reaction gas containing R-1132(E) with higher selectivity than in conventional methods. More specifically, the present disclosure provides a method for producing a reaction gas containing (E)-1,2-difluoroethylene (R-1132(E)), wherein: (1) the method includes a step for subjecting a raw material gas containing at least one fluoromethane compound selected from the group consisting of chlorodifluoromethane (R-22), difluoromethane (R-32) and fluoromethane (R-41) to a reaction that includes thermal decomposition so as to obtain the reaction gas; and (2) the raw material gas has a water vapor content of 1 vol% or less.

Inventors:
TAKAKUWA TATSUYA (JP)
YAMAMOTO OSAMU (JP)
FUJIWARA KATSUKI (JP)
KURAMOTO KEI (JP)
HASUMOTO YUUTA (JP)
Application Number:
PCT/JP2020/022443
Publication Date:
December 10, 2020
Filing Date:
June 05, 2020
Export Citation:
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Assignee:
DAIKIN IND LTD (JP)
International Classes:
C07C21/18; C07C17/269
Domestic Patent References:
WO2015186557A12015-12-10
WO2015186670A12015-12-10
WO2015186671A12015-12-10
Foreign References:
JP2013241348A2013-12-05
JP2013237624A2013-11-28
JP2016056132A2016-04-21
JP2012237472A2012-12-06
Attorney, Agent or Firm:
SAEGUSA & PARTNERS (JP)
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