Title:
METHOD FOR PRODUCING RELIEF PRINTING PLATE
Document Type and Number:
WIPO Patent Application WO/2011/093166
Kind Code:
A1
Abstract:
Disclosed is a method for producing a relief printing plate, wherein a rinsing liquid for the production of a relief printing plate, which is capable of easily removing dust produced on the printing plate during the engraving and has a small effect on the relief printing plate, is used.
Specifically disclosed is a method for producing a relief printing plate, which is characterized by comprising, in the following order: a step of preparing a relief printing original plate that has, on a supporting body, a relief-forming layer containing a non-elastomer binder polymer, a plasticizer and a photothermal converter; a step of engraving the relief printing original plate by exposure to light using a laser; and a step of removing engraving dust with a rinsing liquid for the production of a relief printing plate, said dust being produced by the engraving. The method for producing a relief printing plate is also characterized in that the rinsing liquid for the production of a relief printing plate contains a nonionic surfactant.
Inventors:
ADACHI KEIICHI (JP)
Application Number:
PCT/JP2011/050710
Publication Date:
August 04, 2011
Filing Date:
January 18, 2011
Export Citation:
Assignee:
FUJIFILM CORP (JP)
ADACHI KEIICHI (JP)
ADACHI KEIICHI (JP)
International Classes:
B41C1/05; B41N1/12; B41N3/06
Domestic Patent References:
| WO2003022594A1 | 2003-03-20 |
Foreign References:
| JP2004144868A | 2004-05-20 | |||
| JP2006523552A | 2006-10-19 | |||
| EP0463016A1 | 1992-01-02 | |||
| JP2009262526A | 2009-11-12 |
Attorney, Agent or Firm:
NOGUCHI YASUHIRO (JP)
Takahiro Noguchi (JP)
Takahiro Noguchi (JP)
Download PDF:
Claims: