METHOD FOR PRODUCING RESIN SUBSTRATE HAVING HARD COAT LAYER, AND RESIN SUBSTRATE HAVING HARD COAT LAYER

WIPO Patent Application WO/2011/090172

A1

Disclosed are: a method for producing a resin substrate having a hard coat layer, by which a hard coat having sufficient scratch resistance can be formed on a resin substrate; and a resin substrate having a hard coat layer that has excellent scratch resistance. Specifically disclosed is a method for producing a resin substrate that has a hard coat layer on at least one surface thereof. The method for producing a resin substrate having a hard coat layer is characterized by comprising: a step in which a hard coat agent composition containing an organopolysiloxane is applied over at least one surface of the resin substrate so as to form a coating film composed of the composition, and then the coating film is subjected to first heat treatment, thereby forming a cured film; an irradiation step in which the cured film is subjected to Xe2 excimer light irradiation treatment in an atmosphere having an oxygen concentration of 5% by volume or less; and a step in which the cured film after the irradiation step is subjected to oxidation treatment and then to second heat treatment, thereby obtaining a hard coat layer.

YAMAMOTO, Kyoko (Limited 12-1, Yurakucho 1-chome, Chiyoda-k, Tokyo 05, 〒1008405, JP)
山本　今日子 (〒05 東京都千代田区有楽町一丁目１２番１号　旭硝子株式会社内 Tokyo, 〒1008405, JP)

JP2011/051126

July 28, 2011

January 21, 2011

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ASAHI GLASS COMPANY, LIMITED (12-1, Yurakucho 1-chome Chiyoda-k, Tokyo 05, 〒1008405, JP)
旭硝子株式会社 (〒05 東京都千代田区有楽町一丁目１２番１号 Tokyo, 〒1008405, JP)
YAMAMOTO, Kyoko (Limited 12-1, Yurakucho 1-chome, Chiyoda-k, Tokyo 05, 〒1008405, JP)

B05D3/06; B05D5/00; B05D7/24; B32B27/00

SENMYO, Kenji et al. (4th Floor, SIA Kanda Square 17, Kanda-konyacho, Chiyoda-k, Tokyo 35, 〒1010035, JP)

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