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Title:
METHOD FOR PRODUCING SHIKIMIC ACID
Document Type and Number:
WIPO Patent Application WO/2019/039553
Kind Code:
A1
Abstract:
Provided is a method for producing shikimic acid, by which shikimic acid is able to be obtained with high yield. A method for producing shikimic acid, which comprises a step for collecting shikimic acid from a solution that contains shikimic acid, and which is characterized in that the step for collecting shikimic acid comprises a step (P1) wherein the solution that contains shikimic acid is treated with a hydrophobic synthetic adsorbent, thereby obtaining a treated solution, and a step (P2) wherein a fractionation containing shikimic acid is obtained from a treated solution, which has been subjected to at least the step (P1), by means of ion exchange chromatography using an amphoteric ion exchange resin.

Inventors:
UTSUMI KAZUO (JP)
NAKAMURA YASUSHI (JP)
TOYOSHIMA HIROKAZU (JP)
TAKEDA TOORU (JP)
Application Number:
PCT/JP2018/031182
Publication Date:
February 28, 2019
Filing Date:
August 23, 2018
Export Citation:
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Assignee:
SHINRYO CORP (JP)
International Classes:
C07C51/47; C07C62/32
Domestic Patent References:
WO2014189357A12014-11-27
Foreign References:
US20070161818A12007-07-12
US20070149805A12007-06-28
JP2012188374A2012-10-04
Attorney, Agent or Firm:
KATO, Hisashi et al. (JP)
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