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Patent Searching and Data


Title:
METHOD FOR PRODUCING SILICA LAYER
Document Type and Number:
WIPO Patent Application WO/2019/125040
Kind Code:
A1
Abstract:
The present application relates to a method for producing a silica layer. The present application may provide a method by which a silica layer, which is a layer having a silica network as a main component, has a pore formed therein, and has a properly controlled optical characteristic including a refractive index and the like, can be easily formed through a simple process at a low temperature without using expensive equipment.

Inventors:
OH, Hyun Taek (LG Chem Research Park, 188, Munji-ro,,Yuseong-gu, Daejeon, 34122, KR)
SIN, Chang Hoon (LG Chem Research Park, 188, Munji-ro,,Yuseong-gu, Daejeon, 34122, KR)
PARK, Kwang Seung (LG Chem Research Park, 188, Munji-ro,,Yuseong-gu, Daejeon, 34122, KR)
PARK, Moon Soo (LG Chem Research Park, 188, Munji-ro,,Yuseong-gu, Daejeon, 34122, KR)
Application Number:
KR2018/016447
Publication Date:
June 27, 2019
Filing Date:
December 21, 2018
Export Citation:
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Assignee:
LG CHEM, LTD. (128, Yeoui-daero,Yeongdeungpo-gu, Seoul, 07336, KR)
International Classes:
B05D5/06; B01J27/06; B01J31/02; B05D3/02; B05D7/24; C09D5/00; C09D7/40; G02B1/113
Foreign References:
KR100710097B12007-04-23
KR20150143573A2015-12-23
KR20070080566A2007-08-10
KR20050086508A2005-08-30
JP5120547B22013-01-16
Attorney, Agent or Firm:
DANA PATENT LAW FIRM (5th Floor, New Wing Gwangsung Bldg.,,11, Yeoksam-ro 3-gil,,Gangnam-gu, Seoul, 06242, KR)
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