Title:
METHOD FOR PRODUCING SILICA LAYER
Document Type and Number:
WIPO Patent Application WO/2019/125040
Kind Code:
A1
Abstract:
The present application relates to a method for producing a silica layer. The present application may provide a method by which a silica layer, which is a layer having a silica network as a main component, has a pore formed therein, and has a properly controlled optical characteristic including a refractive index and the like, can be easily formed through a simple process at a low temperature without using expensive equipment.
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Inventors:
OH HYUN TAEK (KR)
SIN CHANG HOON (KR)
PARK KWANG SEUNG (KR)
PARK MOON SOO (KR)
SIN CHANG HOON (KR)
PARK KWANG SEUNG (KR)
PARK MOON SOO (KR)
Application Number:
PCT/KR2018/016447
Publication Date:
June 27, 2019
Filing Date:
December 21, 2018
Export Citation:
Assignee:
LG CHEMICAL LTD (KR)
International Classes:
B05D5/06; B01J27/06; B01J31/02; B05D3/02; B05D7/24; C09D5/00; C09D7/40; G02B1/113
Foreign References:
| KR100710097B1 | 2007-04-23 | |||
| KR20150143573A | 2015-12-23 | |||
| KR20070080566A | 2007-08-10 | |||
| KR20050086508A | 2005-08-30 | |||
| JP5120547B2 | 2013-01-16 | |||
| KR20170178519A | 2017-12-22 |
Other References:
See also references of EP 3730223A4
Attorney, Agent or Firm:
DANA PATENT LAW FIRM (KR)
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