METHOD FOR PRODUCING SILICEOUS FILM AND POLYSILAZANE COATING TREATMENT LIQUID USED THEREFOR

Title:

METHOD FOR PRODUCING SILICEOUS FILM AND POLYSILAZANE COATING TREATMENT LIQUID USED THEREFOR

Document Type and Number:

WIPO Patent Application WO/2011/027826

Kind Code:

A1

Abstract:

Provided is a method for obtaining a siliceous film, which has a hydrophilic surface at low temperatures, by using a polysilazane compound. The method involves coating a surface of a substrate with a composition including a polysilazane compound and a compound for accelerating a silica conversion reaction; applying a polysilazane coating treatment liquid onto the coating obtained; and converting the polysilazane compound into a siliceous film at a temperature of 300ºC or less. The polysilazane coating treatment liquid includes hydrogen peroxide, alcohol and solvent.

Inventors:

OZAKI YUKI (JP)
HAYASHI MASANOBU (JP)

Application Number:

PCT/JP2010/065035

Publication Date:

March 10, 2011

Filing Date:

September 02, 2010

Export Citation:

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Assignee:

AZ ELECTRONIC MATERIALS JAPAN (JP)
AZ ELECTRONIC MATERIALS USA (US)
OZAKI YUKI (JP)
HAYASHI MASANOBU (JP)

International Classes:

H01L21/316

Foreign References:

JP2007096046A	2007-04-12
JP2005045230A	2005-02-17
JP2004347778A	2004-12-09
JP2003508895A	2003-03-04
JP2002524848A	2002-08-06
JPH0931333A	1997-02-04
JPH09275135A	1997-10-21
JP2005045230A	2005-02-17
JPH06299118A	1994-10-25
JPH11116815A	1999-04-27
JP2009111029A	2009-05-21

Other References: