Title:
METHOD FOR PRODUCING SOLUBLE CROSS-LINKED POLYMER
Document Type and Number:
WIPO Patent Application WO/2017/094251
Kind Code:
A1
Abstract:
[Problem] To provide a method for producing a soluble cross-linked polymer that is highly compatible with coating compositions, and that satisfactorily reduces pimple defects on a coating film when used as an additive. [Solution] A monomer A having two or more radical polymerizable double bonds per molecule is polymerized in a first organic solvent in the presence of a polymerization initiator B in an amount of 5 mol% to 200 mol% per mole of the monomer A,at a temperature that is at least 20˚C higher than the 10-hour half-life temperature of the polymerization initiator B, without refluxing.
Inventors:
TAMURA AKIO (JP)
Application Number:
PCT/JP2016/004985
Publication Date:
June 08, 2017
Filing Date:
November 28, 2016
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
C08F2/06; C08F12/00; C08F20/00
Domestic Patent References:
| WO2010126140A1 | 2010-11-04 | |||
| WO2010137724A1 | 2010-12-02 |
Foreign References:
| JP2010024330A | 2010-02-04 | |||
| JP2009155619A | 2009-07-16 |
Attorney, Agent or Firm:
YANAGIDA, Masashi et al. (JP)
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