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Patent Searching and Data


Title:
METHOD OF PRODUCING SOLVENT-RESISTANT NANOFILTRATION SEPARATION MEMBRANE
Document Type and Number:
WIPO Patent Application WO/2022/145637
Kind Code:
A1
Abstract:
Provided is a solvent-resistant nanofiltration separation membrane which goes through a post-treatment process using a good solvent, so that the separation membrane performance may be effectively improved by an uncrosslinked selective layer and rearrangement of size and structure of separation membrane pores. Specifically, the solvent-resistant nanofiltration separation membrane has excellent chemical resistance, and also may improve both permeation performance and rejection performance which conventionally conflict with each other. The nanofiltration separation membrane produced by the production method of the present invention may be applied to a nanofiltration system to effectively filter solutes having a number average molecular weight of 100 g/mol or more and also provide a system having high efficiency.

Inventors:
PARK HOSIK (KR)
CHO YOUNG HOON (KR)
KIM SANG DEUK (KR)
PARK YOU IN (KR)
NAM SEUNG EUN (KR)
KIM IN CHUL (KR)
WON GAYEON (KR)
KIM TAE KYUNG (KR)
AN EUN SUK (KR)
YOO YOUNGMIN (KR)
PARK AHRUMI (KR)
KWON SEI (KR)
Application Number:
PCT/KR2021/013417
Publication Date:
July 07, 2022
Filing Date:
September 30, 2021
Export Citation:
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Assignee:
KOREA RES INST CHEMICAL TECH (KR)
International Classes:
B01D67/00; B01D61/02; B01D69/06; B01D69/10; B01D69/12; B01D71/62
Domestic Patent References:
WO2019171276A12019-09-12
Foreign References:
US20190176092A12019-06-13
KR102176822B12020-11-10
US20160375410A12016-12-29
KR20140031627A2014-03-13
Attorney, Agent or Firm:
PLUS INTERNATIONAL IP LAW FIRM (KR)
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