METHOD OF PRODUCING SPEAKER DIAPHRAGM AND SPEAKER DIAPHRAGM FORMED BY THIS METHOD AND SPEAKER USING THIS

Title:

METHOD OF PRODUCING SPEAKER DIAPHRAGM AND SPEAKER DIAPHRAGM FORMED BY THIS METHOD AND SPEAKER USING THIS

Document Type and Number:

WIPO Patent Application WO/1999/065272

Kind Code:

A1

Abstract:

A method of producing a speaker diaphragm used in a variety of acoustic devices and a speaker diaphragm formed by this method and a speaker using this; specifically a method of producing a speaker diaphragm capable of preventing the deformation of a speaker diaphragm otherwise caused by variations in wettability in plasma processing and by heat and being excellent in productivity, and a speaker excellent in input resistance. A high-productivity method of producing a speaker diaphragm comprising the steps of disposing an aluminum-mesh-made etching tunnel (2) on the inner side of a cylindrical quartz reaction tank (1), arranging speaker diaphragms (4) inside the cylinder at preset intervals and disposing opposing electrodes (5) on the outer side of the reaction tank (1), whereby thermal deformation is prevented due to a low-temperature plasma processing and a uniform wettability is ensured by a mesh-made etching tunnel (2); and a speaker enhanced in input resistance by stabilizing an adhesion bonding and increasing a bonding force between the speaker diaphragm (4) and a voice coil (18) and/or an edging (19a) by ensuring a uniform wettability.

Inventors:

SATO HITOSHI (JP)
MIZONE SINYA (JP)
IKEDA KIYOSHI (JP)
YAMAZAKI HIROKO (JP)

Application Number:

PCT/JP1999/003140

Publication Date:

December 16, 1999

Filing Date:

June 11, 1999

Export Citation:

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Assignee:

MATSUSHITA ELECTRIC IND CO LTD (JP)
SATO HITOSHI (JP)
MIZONE SINYA (JP)
IKEDA KIYOSHI (JP)
YAMAZAKI HIROKO (JP)

International Classes:

H04R7/02; H04R31/00; (IPC1-7): H04R7/02; H04R31/00

Foreign References:

JPH06225388A	1994-08-12
JPH05168093A	1993-07-02

Other References: