METHOD FOR PRODUCING STEP-AND-REPEAT VAPOR DEPOSITION MASK, STEP-AND-REPEAT VAPOR DEPOSITION MASK OBTAINED THEREFROM, AND METHOD FOR PRODUCING ORGANIC SEMICONDUCTOR ELEMENT

WIPO Patent Application WO/2013/105645

A1

Provided is a method for producing a step-and-repeat vapor deposition mask which can be light weight and have high definition even when the size is increased. Each of a plurality of masks disposed in an open space within a frame is configured from a metal mask on which slits are disposed and a resin mask which is positioned on the surface of the metal mask and on which multiple openings corresponding to the pattern formed by means of vapor deposition are horizontally and vertically arranged in rows. During the formation of the plurality of masks, a resin film material for creating each metal mask and resin mask is attached to the frame, the resin film material is processed, and multiple openings corresponding to the pattern formed by means of vapor deposition are horizontally and vertically arranged in rows, thereby producing the step-and-repeat vapor deposition mask having the abovementioned features.

HIROBE YOSHINORI (JP)
MATSUMOTO YUTAKA (JP)
USHIKUSA MASATO (JP)
TAKEDA TOSHIHIKO (JP)
OBATA KATSUNARI (JP)
NISHIMURA HIROYUKI (JP)

PCT/JP2013/050426

July 18, 2013

January 11, 2013

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DAINIPPON PRINTING CO LTD (JP)

C23C14/24; H01L51/50; H05B33/10

JP2004190057A	2004-07-08
JP2008121060A	2008-05-29
JPH07300664A	1995-11-14
JP2002235166A	2002-08-23
JP2009001895A	2009-01-08

INTECT INTERNATIONAL PATENT OFFICE et al. (JP)
Patent business corporation Intect International Patent Office (JP)

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