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Title:
METHOD FOR PRODUCING SUBSTRATE HAVING PATTERNED CONDUCTIVE POLYMER FILM AND SUBSTRATE HAVING PATTERNED CONDUCTIVE POLYMER FILM
Document Type and Number:
WIPO Patent Application WO/2010/058778
Kind Code:
A1
Abstract:
A method for producing a substrate having a patterned conductive polymer film, wherein removability is excellent and discoloration in an end portion of a conductive polymer film is suppressed when a resist film is removed from the conductive polymer film.  The method for producing a substrate having a patterned conductive polymer film, which is characterized by comprising, in the following order: a step of forming a substrate on which a conductive polymer film and a patterned resist film are arranged in this order; a step of etching the conductive polymer into a pattern corresponding to the pattern of the resist film; and a step of removing the resist film on the conductive polymer film using a remover liquid.  The method is also characterized in that the remover liquid contains 5-40% by weight of an organic solvent (A) selected from the group consisting of N-alkyl pyrrolidones, carboxylic acid amide compounds, dialkyl sulfoxides and ether compounds, and 60-95% by weight of an organic solvent (B) selected from the group consisting of alkyl lactones, alkylene carbonates and polyhydric alcohols.

Inventors:
IHARA Takashi (C/O TOAGOSEI CO. LTD, 17-23, Showa-cho, Minato-ku, Nagoya-sh, Aichi 26, 〒4550026, JP)
Application Number:
JP2009/069524
Publication Date:
May 27, 2010
Filing Date:
November 18, 2009
Export Citation:
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Assignee:
TOAGOSEI CO., LTD. (1-14-1, Nishi-Shimbashi Minato-k, Tokyo 19, 〒1058419, JP)
東亞合成株式会社 (〒19 東京都港区西新橋1丁目14番1号 Tokyo, 〒1058419, JP)
TSURUMI SODA CO., LTD. (1-7 Suehiro-cho, Tsurumi-ku Yokohama-sh, Kanagawa 45, 〒2300045, JP)
International Classes:
H01B13/00; G03F7/40; G03F7/42; H01B5/14; H05K1/09; H05K3/06
Attorney, Agent or Firm:
NOGUCHI Yasuhiro (NOGUCHI PATENT FIRM, Urban Toranomon Bldg. 16-4, Toranomon 1-chome, Minato-k, Tokyo 01, 〒1050001, JP)
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