Title:
METHOD FOR PRODUCING SUBSTRATE HAVING SURFACE NANOSTRUCTURE
Document Type and Number:
WIPO Patent Application WO/2012/111694
Kind Code:
A1
Abstract:
Provided is a method for producing a substrate having a surface nanostructure comprising a phase separation step for heating and thereby promoting phase separation of a layer containing a block copolymer of multiple blocks bonded together that has been formed on a substrate, a decomposition step for decomposing at least a portion of the phase formed from at least one block of the multiple blocks that form the block copolymer of this layer, and a selective removal step for selectively removing the phase containing the blocks decomposed in the decomposition step by immersing the layer in developing solution, wherein the primary component of the developing solution is an organic solvent having an SP value between 7.5 and 11.5 (cal/cm3)1/2 and a vapor pressure at 25ºC that is less than 2.1 kPa, or benzene optionally substituted by alkyl groups, alkoxy groups, or halogen atoms.
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Inventors:
FUJIKAWA SHIGENORI (JP)
HAYAKAWA HARUMI (JP)
SENZAKI TAKAHIRO (JP)
MIYAGI KEN (JP)
HAYAKAWA HARUMI (JP)
SENZAKI TAKAHIRO (JP)
MIYAGI KEN (JP)
Application Number:
PCT/JP2012/053499
Publication Date:
August 23, 2012
Filing Date:
February 15, 2012
Export Citation:
Assignee:
RIKEN (JP)
TOKYO OHKA KOGYO CO LTD (JP)
FUJIKAWA SHIGENORI (JP)
HAYAKAWA HARUMI (JP)
SENZAKI TAKAHIRO (JP)
MIYAGI KEN (JP)
TOKYO OHKA KOGYO CO LTD (JP)
FUJIKAWA SHIGENORI (JP)
HAYAKAWA HARUMI (JP)
SENZAKI TAKAHIRO (JP)
MIYAGI KEN (JP)
International Classes:
H01L21/027; B82B3/00; G03F7/32; G03F7/38
Foreign References:
| JP2009138014A | 2009-06-25 | |||
| JP2011126000A | 2011-06-30 | |||
| JP2007297644A | 2007-11-15 |
Attorney, Agent or Firm:
TANAI Sumio et al. (JP)
Sumio Tanai (JP)
Sumio Tanai (JP)
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Claims: