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Patent Searching and Data


Title:
METHOD FOR PRODUCING SURFACE MICROMECHANICAL STRUCTURES, AND SENSOR
Document Type and Number:
WIPO Patent Application WO2002062698
Kind Code:
A3
Abstract:
The invention relates to a method for producing surface micromechanical structures having a high aspect ratio. At least one sacrificial layer (20) is provided between a substrate (30) and a functional layer (10). Trenches (60, 61) are provided in said functional layer (10) by means of a plasma etching process, said trenches uncovering at least some surface areas (21, 22) of the sacrificial layer (20). According to the invention, a further layer (70) is deposited at least partially on the lateral walls of the trenches, but not on the uncovered surface areas (21, 22) of the sacrificial layer (20), in order to increase the aspect ratio of said trenches. The invention also relates to a sensor, especially an acceleration or rotational rate sensor.

Inventors:
FISCHER FRANK (DE)
FREY WILHELM (US)
METZGER LARS (DE)
Application Number:
PCT/DE2002/000397
Publication Date:
July 17, 2003
Filing Date:
February 04, 2002
Export Citation:
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Assignee:
BOSCH GMBH ROBERT (DE)
FISCHER FRANK (DE)
FREY WILHELM (US)
METZGER LARS (DE)
International Classes:
B81B3/00; B81C1/00; G01P15/08; G01P15/125; (IPC1-7): B81B3/00; B81C1/00
Domestic Patent References:
WO1994018697A11994-08-18
WO1996008036A11996-03-14
Foreign References:
DE19847455A12000-04-27
US5756901A1998-05-26
DE4420962A11995-12-21
Other References:
PATENT ABSTRACTS OF JAPAN vol. 018, no. 480 (E - 1603) 8 September 1994 (1994-09-08)
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