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Title:
METHOD FOR PRODUCING TRANSPARENT CONDUCTIVE FILM, TRANSPARENT CONDUCTIVE FILM, TRANSPARENT CONDUCTIVE SUBSTRATE AND DEVICE COMPRISING SAME
Document Type and Number:
WIPO Patent Application WO/2010/064719
Kind Code:
A1
Abstract:
Provided is a method for producing a transparent conductive film which is formed via a coating step, a drying step and a baking step, characterized in that, in the baking step, baking is conducted by heating a dried coating film, which comprises an organic metal compound as the main component, to a baking temperature equal to or greater than at least the crystallization point of an inorganic component in an oxygen-containing atmosphere at a temperature at least 10oC lower than the dewpoint, so that the organic component contained in the dried coating film is removed by heat decomposition, combustion or both heat decomposition and combustion to thereby form a conductive oxide microparticle layer that is densely filled with conductive oxide microparticles comprising a metal oxide as the main component.  Also provided is a transparent conductive film which has both high transparency and high conductivity and shows excellent film strength.
Inventors:
YUKINOBU Masaya (, ,18-5, Nakakokubun 3-chome, Ichikawa-sh, Chiba 88, 〒2728588, JP)
行延 雅也 (, 〒88 千葉県市川市中国分3丁目18番5号 住友金属鉱山株式会社 市川研究所内 Chiba, , 〒2728588, JP)
Application Number:
JP2009/070442
Publication Date:
June 10, 2010
Filing Date:
December 01, 2009
Export Citation:
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Assignee:
SUMITOMO METAL MINING CO., LTD. (11-3, Shimbashi 5-chome Minato-k, Tokyo 16, 〒1058716, JP)
住友金属鉱山株式会社 (, 〒16 東京都港区新橋5丁目11番3号 Tokyo, , 〒1058716, JP)
YUKINOBU Masaya (, ,18-5, Nakakokubun 3-chome, Ichikawa-sh, Chiba 88, 〒2728588, JP)
International Classes:
H01B13/00; H01B5/14; H01L31/04; H05K9/00;
Attorney, Agent or Firm:
OSHIDA Yoshitaka (Ginza Bldg, 3-12 Ginza 3-chome, Chuo-k, Tokyo 61, 〒1040061, JP)
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Claims: