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Title:
METHOD FOR PRODUCING TRANSPARENT CONDUCTIVE MATERIAL
Document Type and Number:
WIPO Patent Application WO/2010/119687
Kind Code:
A1
Abstract:
A transparent conductive material is obtained by forming a nitride film on a base and anodizing the whole or a part of the nitride film at a temperature of 0˚C or less, said nitride film being composed of titanium nitride containing at least one different metal element selected from the group consisting of Zr, Hf, Nb, Ta, Mo and W, niobium nitride containing at least one different metal element selected from the group consisting of Mo and W, and/or tantalum nitride containing at least one different metal element selected from the group consisting of Mo and W. A transparent electrode, an electronic device, a flat panel display, a touch panel or a solar cell is obtained using the transparent conductive material.

Inventors:
MITSUMOTO, Ryuichi (13-9 Shiba Daimon 1-chome, Minato-k, Tokyo 18, 〒1058518, JP)
光本竜一 (〒18 東京都港区芝大門一丁目13番9号昭和電工株式会社内 Tokyo, 〒1058518, JP)
SHIRAKAWA, Akihiko (13-9 Shiba Daimon 1-chome, Minato-k, Tokyo 18, 〒1058518, JP)
Application Number:
JP2010/002730
Publication Date:
October 21, 2010
Filing Date:
April 15, 2010
Export Citation:
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Assignee:
SHOWA DENKO K.K. (13-9, Shiba Daimon 1-chome Minato-k, Tokyo 18, 〒1058518, JP)
昭和電工株式会社 (〒18 東京都港区芝大門一丁目13番9号 Tokyo, 〒1058518, JP)
MITSUMOTO, Ryuichi (13-9 Shiba Daimon 1-chome, Minato-k, Tokyo 18, 〒1058518, JP)
光本竜一 (〒18 東京都港区芝大門一丁目13番9号昭和電工株式会社内 Tokyo, 〒1058518, JP)
International Classes:
H01B13/00; B32B7/02; B32B9/00; C23C14/06; C23C14/58; H01B5/14; H01L31/04
Attorney, Agent or Firm:
KIKUMA, Tadayuki (KIKUMA & ASSOCIATES, FREUND MITA 712 14-5, Mita 2-chome, Minato-k, Tokyo 73, 〒1080073, JP)
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