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Title:
METHOD FOR PRODUCING TRANSPARENT ELECTROCONDUCTIVE FILM
Document Type and Number:
WIPO Patent Application WO/2024/004226
Kind Code:
A1
Abstract:
A method for producing a transparent electroconductive film (3), in which a transparent electroconductive layer (2) is formed on one thickness-direction surface of a continuous substrate (1). The method for producing a transparent electroconductive film (3) comprises a first step, in which the substrate (1) is prepared, a second step, in which some of the transparent electroconductive layer (2) is formed on one thickness-direction surface of the substrate (1) in a vacuum atmosphere, and a third step, in which, while the some of the transparent electroconductive layer (2) is being heated in a vacuum atmosphere, the remainder of the transparent electroconductive layer (2) is formed on one thickness-direction surface of the some of the transparent electroconductive layer (2).

Inventors:
FUJINO NOZOMI (JP)
KARASUDA TAISUKE (JP)
TAKAO HIROYUKI (JP)
Application Number:
PCT/JP2022/034345
Publication Date:
January 04, 2024
Filing Date:
September 14, 2022
Export Citation:
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Assignee:
NITTO DENKO CORP (JP)
International Classes:
B32B37/15; C23C14/08; C23C14/56
Domestic Patent References:
WO2021240962A12021-12-02
WO2011046050A12011-04-21
Foreign References:
JP2013049915A2013-03-14
JP2022075677A2022-05-18
JP2016164848A2016-09-08
JP2022063374A2022-04-22
JP2012237057A2012-12-06
JP2015132005A2015-07-23
JP2006249471A2006-09-21
Attorney, Agent or Firm:
OKAMOTO, Hiroyuki et al. (JP)
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