Title:
METHOD FOR PRODUCING TRANSPARENT THIN FILM HAVING HIGH REFRACTIVE INDEX, AND THIN FILM PRODUCED BY SAID METHOD
Document Type and Number:
WIPO Patent Application WO/2015/029844
Kind Code:
A1
Abstract:
Provided are: a method by which a patterned thin film having high refractive index and high transparency can be easily produced in a short time; and a thin film having high refractive index, which is produced by this method.
A method for producing a thin film, which comprises: a first step for forming a coating film on a substrate using a sol that contains a metal oxide modified with a phosphorus compound represented by formula (1) (in formula (1), R1 represents a hydrogen atom, an alkyl group, an alkynyl group, an alkenyl group, an aryl group, an aliphatic heterocyclic group or an aromatic heterocyclic group; R2 represents a divalent organic residue; and n represents 1 or 2); a second step for curing the coating film on the substrate, which is obtained in the first step, by irradiation of light; and a third step for providing the cured product, which is obtained in the second step, with energy by heating and/or irradiation of light.
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Inventors:
MATSUKAWA KIMIHIRO (JP)
WATASE SEIJI (JP)
MITAMURA KOJI (JP)
HIRATA MANABU (JP)
WATASE SEIJI (JP)
MITAMURA KOJI (JP)
HIRATA MANABU (JP)
Application Number:
PCT/JP2014/071712
Publication Date:
March 05, 2015
Filing Date:
August 20, 2014
Export Citation:
Assignee:
OSAKA MUNICIPAL TECH RES INST (JP)
DAIHACHI CHEM IND (JP)
DAIHACHI CHEM IND (JP)
International Classes:
B05D3/06; B05D3/02; B32B9/00; C09D4/00; C09D7/12
Domestic Patent References:
WO2013161859A1 | 2013-10-31 |
Foreign References:
JP2001310423A | 2001-11-06 | |||
JP2010181801A | 2010-08-19 | |||
JP2008308593A | 2008-12-25 | |||
JP2001089535A | 2001-04-03 | |||
JP2012025882A | 2012-02-09 | |||
JP2007521355A | 2007-08-02 |
Other References:
See also references of EP 3040129A4
Attorney, Agent or Firm:
IWATANI, Ryo (JP)
Tatsu Iwatani (JP)
Tatsu Iwatani (JP)
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