Title:
METHOD FOR PRODUCING VAPOR DEPOSITION MASK, METHOD FOR PRODUCING ORGANIC SEMICONDUCTOR ELEMENT, AND METHOD FOR PRODUCING ORGANIC EL DISPLAY
Document Type and Number:
WIPO Patent Application WO/2018/066611
Kind Code:
A1
Abstract:
This method for producing a vapor deposition mask is used to produce a vapor deposition mask in which a metal mask 10 having a metal mask opening 15 is laminated on one surface of a resin mask 20 having resin mask openings 25 corresponding to a pattern to be formed by vapor deposition. In the method, the multiple resin mask openings 25 are formed so that in a thickness-direction cross section of the resin mask, one resin mask opening 25a among the multiple resin mask openings 25 is formed so that the acute angle (θ1) between one inner wall surface defining the one resin mask opening and the other surface of the resin mask and the acute angle (θ2) between the other inner wall surface defining the one resin mask opening and the other surface of the resin mask are different from each other.
Inventors:
KAWASAKI HIROSHI (JP)
OBATA KATSUNARI (JP)
OBATA KATSUNARI (JP)
Application Number:
PCT/JP2017/036161
Publication Date:
April 12, 2018
Filing Date:
October 04, 2017
Export Citation:
Assignee:
DAINIPPON PRINTING CO LTD (JP)
International Classes:
C23C14/04; H01L51/50; H05B33/10
Foreign References:
| JP2015120947A | 2015-07-02 | |||
| JP2013165058A | 2013-08-22 | |||
| JP2013147739A | 2013-08-01 | |||
| JP2010188418A | 2010-09-02 |
Attorney, Agent or Firm:
INTECT INTERNATIONAL PATENT OFFICE et al. (JP)
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