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Patent Searching and Data


Title:
METHOD FOR THE PRODUCTION OF AND PROTECTIVE LAYER FOR A LAYER OF LUMINESCENT MATERIAL
Document Type and Number:
WIPO Patent Application WO/2004/047121
Kind Code:
A2
Abstract:
The invention relates to a protective layer for an image detector used for an x-ray image. Said image detector comprises a layer of luminescent material (3), which is to be protected against mechanical stress and moisture. A polymeric protective layer (10 is disposed thereupon. The inventive protective layer (1) is hardened exclusively in an area (7) which does not border the layer of luminescent material (3). The hardened area (7) provides protection against mechanical stress while the remaining area forms a moisture barrier. The invention also relates to a method for producing a polymeric protective layer (1) on an image detector for an x-ray image, which is provided with a layer of luminescent material (3). The protective layer (1) is deposited on the layer of luminescent material (3) in a first step of the inventive method and is hardened only in an area which does not border the layer of luminescent material (3) in a second step (15) thereof.

Inventors:
FUCHS MANFRED (DE)
HACKENSCHMIED PETER (DE)
HELL ERICH (DE)
Application Number:
PCT/DE2003/003457
Publication Date:
June 03, 2004
Filing Date:
October 17, 2003
Export Citation:
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Assignee:
SIEMENS AG (DE)
FUCHS MANFRED (DE)
HACKENSCHMIED PETER (DE)
HELL ERICH (DE)
International Classes:
G03B42/00; G03C5/17; G21K4/00; G21K; (IPC1-7): G21K/
Foreign References:
DE10048810A12002-04-18
EP0304300B11992-12-30
EP0510753B11996-10-23
EP0908900A11999-04-14
Other References:
PATENT ABSTRACTS OF JAPAN Bd. 2002, Nr. 10, 10. Oktober 2002 (2002-10-10) & JP 2002 174697 A (FUJI PHOTO FILM CO LTD), 21. Juni 2002 (2002-06-21)
Attorney, Agent or Firm:
SIEMENS AKTIENGESELLSCHAFT (München, DE)
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