Title:
METHOD FOR THE PRODUCTION OF SPUTTERING TARGETS
Document Type and Number:
WIPO Patent Application WO2002057508
Kind Code:
A3
Abstract:
The invention comprises forming sputtering targets from photocatalyst particles that are free of inert particle treatment. The photocatalyst particles are plasma sprayed onto the target base. For example, a preferred embodiment of the invention comprises plasma spraying uncoated titanium dioxide particles onto a target base. The titanium dioxide particles are optionally plasma sprayed under conditions that result in the target base being coated with substoichiometric titanium oxide, TiOx, where x is less than 2.
Inventors:
HARTIG KLAUS (US)
KRISKO ANNETTE J (US)
KRISKO ANNETTE J (US)
Application Number:
PCT/EP2002/000378
Publication Date:
January 03, 2003
Filing Date:
January 14, 2002
Export Citation:
Assignee:
BEKAERT SA NV (BE)
HARTIG KLAUS (US)
KRISKO ANNETTE J (US)
HARTIG KLAUS (US)
KRISKO ANNETTE J (US)
International Classes:
B01J35/02; C23C14/34; (IPC1-7): C23C14/34; C23C14/08; H01J37/34
Domestic Patent References:
| WO1997025451A1 | 1997-07-17 | |||
| WO1997025450A1 | 1997-07-17 |
Foreign References:
| EP0852266A1 | 1998-07-08 |
Other References:
PATENT ABSTRACTS OF JAPAN vol. 012, no. 005 (C - 467) 8 January 1988 (1988-01-08)
PATENT ABSTRACTS OF JAPAN vol. 1999, no. 04 30 April 1999 (1999-04-30)
PATENT ABSTRACTS OF JAPAN vol. 1999, no. 04 30 April 1999 (1999-04-30)
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