Title:
A METHOD FOR PROVIDING AN ECPR MASTER ELECTRODE
Document Type and Number:
WIPO Patent Application WO/2012/084048
Kind Code:
A8
Abstract:
A method for providing a topographical pattern on a conducting or semiconducting carrier element of an ECPR master electrode is provided. The method comprises the steps of providing an etch mask on a front side of said carrier element; and etching said front side of said carrier element according to an reactive ion etch sequence, wherein said sequence comprises i) etching a first part of a trench of said carrier element using a predetermined set of constant etch parameters, and ii) etching a second part of said trench using a repeated cycle of a predetermined set of alternating etch parameters.
Inventors:
DAINESE MATTEO (FR)
CUTHBERTSON ALAN (FR)
FREDENBERG MIKAEL (SE)
MÖLLER PATRIK (SE)
VAN DEN HOEK WILBERT (US)
ARONSSON CECILIA (SE)
CUTHBERTSON ALAN (FR)
FREDENBERG MIKAEL (SE)
MÖLLER PATRIK (SE)
VAN DEN HOEK WILBERT (US)
ARONSSON CECILIA (SE)
Application Number:
PCT/EP2010/070647
Publication Date:
February 07, 2019
Filing Date:
December 23, 2010
Export Citation:
Assignee:
CENTRE DE RECH PUBLIC – GABRIEL LIPPMANN (LU)
DAINESE MATTEO (FR)
CUTHBERTSON ALAN (FR)
FREDENBERG MIKAEL (SE)
MOELLER PATRIK (SE)
VAN DEN HOEK WILBERT (US)
ARONSSON CECILIA (SE)
DAINESE MATTEO (FR)
CUTHBERTSON ALAN (FR)
FREDENBERG MIKAEL (SE)
MOELLER PATRIK (SE)
VAN DEN HOEK WILBERT (US)
ARONSSON CECILIA (SE)
International Classes:
C25D5/02; C25D7/12; H01L21/288; H01L21/3065
Attorney, Agent or Firm:
LECOMTE & PARTNERS SARL (LU)
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