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Title:
METHOD FOR PURIFYING CHEMICAL ADDED WITH CHELATING AGENT
Document Type and Number:
WIPO Patent Application WO/2008/069136
Kind Code:
A1
Abstract:
Disclosed is a method for removing a chelate complex from a chemical used in a semiconductor production process and containing a compound having a chelating ability. This method also enables to reduce the cleaning load. Specifically disclosed is a method for purifying a chemical which is used in a semiconductor production process and contains a compound having a chelating ability, wherein a chelate complex which is formed by an impurity metal such as nickel or copper and contained in an alkaline chemical is removed therefrom by treating the alkaline chemical with an organic complex adsorbing body.

Inventors:
IIYAMA MASAMITSU (JP)
ABE MITSUGU (JP)
Application Number:
PCT/JP2007/073192
Publication Date:
June 12, 2008
Filing Date:
November 30, 2007
Export Citation:
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Assignee:
NOMURA MICRO SCIENCE KK (JP)
IIYAMA MASAMITSU (JP)
ABE MITSUGU (JP)
International Classes:
B01J41/04; B01J47/10; B01J47/12; B24B37/00; B24B57/02; H01L21/304
Foreign References:
JP2006086144A2006-03-30
JP2005045102A2005-02-17
JPS58216775A1983-12-16
JPS6197096A1986-05-15
JP2001096272A2001-04-10
JPS63272460A1988-11-09
JP2005103700A2005-04-21
Other References:
MIYAHARA S.: "Zoho Jitsuyo Ion Kokan", KABUSHIKI KAISHA KAGAKU KOGYOSHA, 30 August 1984 (1984-08-30), pages 3, 12 - 19, 179 - 182
See also references of EP 2100666A4
Attorney, Agent or Firm:
SUYAMA, Saichi (1 Kandata-cho 2-chome, Chiyoda-ku Tokyo 46, JP)
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