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Title:
METHOD FOR PURIFYING FLUOROOLEFIN HAVING =CF2 OR =CHF STRUCTURE, HIGH PURITY FLUOROOLEFIN, AND MANUFACTURING METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2021/049605
Kind Code:
A1
Abstract:
According to the present invention, impurities are removed from a fluoroolefin having a =CF2 or =CHF structure, the fluoroolefin containing, as the impurities, haloalkenes and/or haloalkanes and/or haloalkynes obtained by a dehydrohalogenation reaction. Provided are: a method, for purifying the fluoroolefin having a =CF2 or =CHF structure, which includes a step for bringing into contact, with a solid adsorbent, the fluoroolefin having a =CF2 or =CHF structure and containing at least one type of impurity from among haloalkanes and/or haloalkenes and/or haloalkynes obtained by a dehydrohalogenation reaction, and adsorption-removing the impurities; a high-purity fluoroolefin; and a manufacturing method therefor.

Inventors:
MATSUTA YUKA (JP)
KATO KOREHITO (JP)
Application Number:
PCT/JP2020/034442
Publication Date:
March 18, 2021
Filing Date:
September 11, 2020
Export Citation:
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Assignee:
KANTO DENKA KOGYO KK (JP)
International Classes:
C07C21/18; C07C17/389
Domestic Patent References:
WO2015125877A12015-08-27
WO2013151070A12013-10-10
Foreign References:
JPS6440436A1989-02-10
KR20100082618A2010-07-19
JP2003261480A2003-09-16
JP2011136955A2011-07-14
JP2006193437A2006-07-27
JP2017196601A2017-11-02
JP2013241389A2013-12-05
CN103449959A2013-12-18
JP2013508265A2013-03-07
JP2020105135A2020-07-09
Attorney, Agent or Firm:
YAMAMOTO, Osamu et al. (JP)
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