Title:
METHOD FOR RECOVERING RHODIUM FROM RHODIUM-CONTAINING PLATING SOLUTION
Document Type and Number:
WIPO Patent Application WO/2023/008588
Kind Code:
A1
Abstract:
The present disclosure addresses the problem of providing a method for recovering rhodium at a high recovery rate from a rhodium-containing plating solution. This method for recovering rhodium from a rhodium-containing plating solution is characterized in that rhodium is recovered by passing a rhodium-containing plating solution through a weakly basic anion-exchange resin and a strongly acidic cation-exchange resin to adsorb rhodium onto the anion-exchange resin and the cation-exchange resin.
Inventors:
YOSHII DAISUKE (JP)
Application Number:
PCT/JP2022/029510
Publication Date:
February 02, 2023
Filing Date:
August 01, 2022
Export Citation:
Assignee:
MATSUDA SANGYO COMPANY LTD (JP)
International Classes:
C22B11/00; B01J39/05; B01J39/20; B01J41/07; B01J41/13; B01J47/028; B01J47/04; C22B3/24; C22B7/00
Foreign References:
| JPS5041717A | 1975-04-16 | |||
| JP2014055331A | 2014-03-27 | |||
| JPS542226A | 1979-01-09 | |||
| JPH03277731A | 1991-12-09 |
Attorney, Agent or Firm:
IP FIRM SHUWA (JP)
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