Title:
METHOD FOR RECOVERING TANTALUM
Document Type and Number:
WIPO Patent Application WO/2011/125510
Kind Code:
A1
Abstract:
Disclosed is a method for recovering high-quality tantalum from tantalum-containing waste, with which it is possible to reduce a variety of impurities such as antimony (Sb) and phosphorous (P), which hinder the reuse of tantalum in tantalum capacitors. The method for recovering tantalum from tantalum-containing waste is characterized in that tantalum-containing waste is subjected to acid treatment and then alkali treatment, thereby recovering tantalum. Acid treatment is preferably carried out using acid containing hydrochloric acid, and alkali treatment is preferably carried out by sodium hydroxide or potassium hydroxide. The tantalum-containing waste is preferably a tantalum sintered compact removed from tantalum capacitors.
More Like This:
Inventors:
YOSHIDA, Mami (Corporate R&D Center, 1333-2, Haraichi, Ageo-sh, Saitama 21, 〒3620021, JP)
吉田 麻美 (〒21 埼玉県上尾市原市１３３３－２ 三井金属鉱業株式会社 総合研究所内 Saitama, 〒3620021, JP)
MATSUZAKI, Kenji (Corporate R&D Center, 1333-2, Haraichi, Ageo-sh, Saitama 21, 〒3620021, JP)
松崎 健嗣 (〒21 埼玉県上尾市原市１３３３－２ 三井金属鉱業株式会社 総合研究所内 Saitama, 〒3620021, JP)
吉田 麻美 (〒21 埼玉県上尾市原市１３３３－２ 三井金属鉱業株式会社 総合研究所内 Saitama, 〒3620021, JP)
MATSUZAKI, Kenji (Corporate R&D Center, 1333-2, Haraichi, Ageo-sh, Saitama 21, 〒3620021, JP)
松崎 健嗣 (〒21 埼玉県上尾市原市１３３３－２ 三井金属鉱業株式会社 総合研究所内 Saitama, 〒3620021, JP)
Application Number:
JP2011/057119
Publication Date:
October 13, 2011
Filing Date:
March 24, 2011
Export Citation:
Assignee:
MITSUI MINING & SMELTING CO.,LTD. (1-11-1, Osaki Shinagawa-k, Tokyo 84, 〒1418584, JP)
三井金属鉱業株式会社 (〒84 東京都品川区大崎一丁目１１番１号 Tokyo, 〒1418584, JP)
YOSHIDA, Mami (Corporate R&D Center, 1333-2, Haraichi, Ageo-sh, Saitama 21, 〒3620021, JP)
吉田 麻美 (〒21 埼玉県上尾市原市１３３３－２ 三井金属鉱業株式会社 総合研究所内 Saitama, 〒3620021, JP)
MATSUZAKI, Kenji (Corporate R&D Center, 1333-2, Haraichi, Ageo-sh, Saitama 21, 〒3620021, JP)
三井金属鉱業株式会社 (〒84 東京都品川区大崎一丁目１１番１号 Tokyo, 〒1418584, JP)
YOSHIDA, Mami (Corporate R&D Center, 1333-2, Haraichi, Ageo-sh, Saitama 21, 〒3620021, JP)
吉田 麻美 (〒21 埼玉県上尾市原市１３３３－２ 三井金属鉱業株式会社 総合研究所内 Saitama, 〒3620021, JP)
MATSUZAKI, Kenji (Corporate R&D Center, 1333-2, Haraichi, Ageo-sh, Saitama 21, 〒3620021, JP)
International Classes:
C22B34/24; B09B3/00; C22B7/00
Attorney, Agent or Firm:
TANAKA AND OKAZAKI (Hongo K&K Bldg, 30-10 Hongo 3-chome, Bunkyo-k, Tokyo 33, 〒1130033, JP)
Download PDF:
Claims:
Previous Patent: OPERATION-INPUTTING DEVICE AND OPERATION-INPUT DETECTION DEVICE
Next Patent: METHOD OF MANUFACTURING OUTER CONDUCTOR
Next Patent: METHOD OF MANUFACTURING OUTER CONDUCTOR