METHOD FOR REGENERATING SPENT CERIA-CONTAINING POLISHING AGENT

WIPO Patent Application WO/2014/042430

A1

The present invention relates to a method for regenerating spent ceria-containing polishing agent, the method allowing regeneration as a regenerated ceria-containing polishing agent, having suitable granular distribution and crystal size and exhibiting an accordant desirable polishing rate, while effectively discarding impurities contained in the spent ceria-containing polishing agent. A method for regenerating the spent ceria-containing polishing agent comprises the steps of: dissolving spent ceria (CeO2)-containing sludge in a solvent comprising strong alkali and hydrofluoric acid; cleaning the spent ceria-containing sludge and discarding impurities containing silica (SiO2); drying the cleaned spent ceria-containing sludge by means of a compact disc (CD) dryer; and, in the presence of a flux comprising ammonium salt, alkali metallic salt, metal oxide, metal oxygen acid or alkaline earth metal, sintering the spent sludge at a temperature of 800℃ or higher.

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KWAK ICK-SOON (KR)
CHO SEUNG-BEOM (KR)
NOH JUN-SEOK (KR)
KIM JONG-PIL (KR)
MOON WON-JAE (KR)

PCT/KR2013/008221

March 20, 2014

September 11, 2013

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LG CHEMICAL LTD (KR)

C02F11/00; B09B3/00; C09K3/14

KR20120021478A	2012-03-09
KR101051207B1	2011-07-21
KR20080036816A	2008-04-29
KR20090097323A	2009-09-16
JP2003094337A	2003-04-03

YOU ME PATENT AND LAW FIRM (649-10 Yoksam-dongKangnam-ku, Seoul 135-080, KR)

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