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Patent Searching and Data


Title:
METHOD FOR REGENERATING SPENT CERIA-CONTAINING POLISHING AGENT
Document Type and Number:
WIPO Patent Application WO/2014/042431
Kind Code:
A1
Abstract:
The present invention relates to a method for regenerating spent ceria-containing polishing agent, the method allowing the regeneration process, comprising a cleaning process, to be efficient and suppressing re-coagulation of the ceria-containing polishing agent during the cleaning process, while effectively discarding the impurities contained in the spent ceria-containing polishing agent. The method for regenerating the spent ceria-containing polishing agent comprises the steps of: mixing spent ceria(CeO2)-containing sludge and a solvent containing a fluorine compound, and selectively dissolving silica(SiO2)-containing impurities contained in the spent sludge; cleaning the spent ceria-containing sludge by passing same through a cross-flow filtration system and selectively discarding the silica(SiO2)-containing impurities; and drying and sintering the cleaned spent ceria-containing sludge.

Inventors:
KWAK ICK-SOON (KR)
CHO SEUNG-BEOM (KR)
NOH JUN-SEOK (KR)
KIM JONG-PIL (KR)
Application Number:
PCT/KR2013/008222
Publication Date:
March 20, 2014
Filing Date:
September 11, 2013
Export Citation:
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Assignee:
LG CHEMICAL LTD (KR)
International Classes:
B24B57/00; B24C11/00
Foreign References:
KR101051207B12011-07-21
JP2011502054A2011-01-20
KR20110132458A2011-12-07
KR20120021478A2012-03-09
JP2011189503A2011-09-29
Attorney, Agent or Firm:
YOU ME PATENT AND LAW FIRM (649-10 Yoksam-dongKangnam-ku, Seoul 135-080, KR)
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