Title:
METHOD FOR REGULATING CONCENTRATION OF DEVELOPING SOLUTION, APPARATUS FOR PREPARING THE DEVELOPING SOLUTION, AND DEVELOPING SOLUTION
Document Type and Number:
WIPO Patent Application WO/2008/065755
Kind Code:
A1
Abstract:
This invention provides a method for regulating the concentration of a developing solution, which can regulate the alkali concentration of an alkaline developing solution used in a photoresist development process so that high-quality development treatment can be carried out, and an apparatus for preparing the developing solution. In the method for regulating the concentration of a developing solution, the concentration of an alkali in the developing solution and the concentration of a carbonate in the developing solution are specified, and the alkali concentration is regulated based on a previously provided relationship between alkali concentration and carbonate concentration, which can realize such a dissolving capability that can render the CD value obtained by the development treatment constant. The apparatus for preparing a developing solution comprises a preparation tank, a feed line for feeding a developing solution to a development process, a recovery line for receiving a used developing solution, a stock solution feed line for feeding a fresh developing solution stock to the preparation tank, a concentration meter for detecting the concentration of an alkali in the developing solution and the concentration of a carbonate in the developing solution, and a control unit forcontrolling the feed of the developing solution stock based on a specific relation.
Inventors:
TAKASAKI, Norihiro (1-2 Kurosakishiroishi, Yahatanishi-ku, Kitakyushu-sh, Fukuoka 4, 806004, JP)
高崎紀博 (〒4 福岡県北九州市八幡西区黒崎城石１番２号三菱化学エンジニアリング株式会社内 Fukuoka, 806004, JP)
SUGIMOTO, Kenji (1-2 Kurosakishiroishi, Yahatanishi-ku, Kitakyushu-sh, Fukuoka 4, 806004, JP)
杉本建二 (〒4 福岡県北九州市八幡西区黒崎城石１番２号三菱化学エンジニアリング株式会社内 Fukuoka, 806004, JP)
TANAHASHI, Ryouta (1-2 Kurosakishiroishi, Yahatanishi-ku, Kitakyushu-sh, Fukuoka 4, 806004, JP)
棚橋亮太 (〒4 福岡県北九州市八幡西区黒崎城石１番２号三菱化学エンジニアリング株式会社内 Fukuoka, 806004, JP)
高崎紀博 (〒4 福岡県北九州市八幡西区黒崎城石１番２号三菱化学エンジニアリング株式会社内 Fukuoka, 806004, JP)
SUGIMOTO, Kenji (1-2 Kurosakishiroishi, Yahatanishi-ku, Kitakyushu-sh, Fukuoka 4, 806004, JP)
杉本建二 (〒4 福岡県北九州市八幡西区黒崎城石１番２号三菱化学エンジニアリング株式会社内 Fukuoka, 806004, JP)
TANAHASHI, Ryouta (1-2 Kurosakishiroishi, Yahatanishi-ku, Kitakyushu-sh, Fukuoka 4, 806004, JP)
棚橋亮太 (〒4 福岡県北九州市八幡西区黒崎城石１番２号三菱化学エンジニアリング株式会社内 Fukuoka, 806004, JP)
Application Number:
JP2007/001319
Publication Date:
June 05, 2008
Filing Date:
November 29, 2007
Export Citation:
Assignee:
MITSUBISHI CHEMICAL ENGINEERING CORPORATION (2-8 Shiba 4-chome, Minato-ku, Tokyo 23, 1080023, JP)
三菱化学エンジニアリング株式会社 (〒23 東京都港区芝浦四丁目２番８号 Tokyo, 1080023, JP)
AZ Electronic Materials (Japan) K.K. (Bunkyo Green Court, 28-8 Honkomagome 2-chome, Bunkyo-k, Tokyo 21, 1130021, JP)
ＡＺエレクトロニックマテリアルズ株式会社 (〒21 東京都文京区本駒込二丁目２８番８号 文京グリーンコート Tokyo, 1130021, JP)
TAKASAKI, Norihiro (1-2 Kurosakishiroishi, Yahatanishi-ku, Kitakyushu-sh, Fukuoka 4, 806004, JP)
高崎紀博 (〒4 福岡県北九州市八幡西区黒崎城石１番２号三菱化学エンジニアリング株式会社内 Fukuoka, 806004, JP)
SUGIMOTO, Kenji (1-2 Kurosakishiroishi, Yahatanishi-ku, Kitakyushu-sh, Fukuoka 4, 806004, JP)
杉本建二 (〒4 福岡県北九州市八幡西区黒崎城石１番２号三菱化学エンジニアリング株式会社内 Fukuoka, 806004, JP)
三菱化学エンジニアリング株式会社 (〒23 東京都港区芝浦四丁目２番８号 Tokyo, 1080023, JP)
AZ Electronic Materials (Japan) K.K. (Bunkyo Green Court, 28-8 Honkomagome 2-chome, Bunkyo-k, Tokyo 21, 1130021, JP)
ＡＺエレクトロニックマテリアルズ株式会社 (〒21 東京都文京区本駒込二丁目２８番８号 文京グリーンコート Tokyo, 1130021, JP)
TAKASAKI, Norihiro (1-2 Kurosakishiroishi, Yahatanishi-ku, Kitakyushu-sh, Fukuoka 4, 806004, JP)
高崎紀博 (〒4 福岡県北九州市八幡西区黒崎城石１番２号三菱化学エンジニアリング株式会社内 Fukuoka, 806004, JP)
SUGIMOTO, Kenji (1-2 Kurosakishiroishi, Yahatanishi-ku, Kitakyushu-sh, Fukuoka 4, 806004, JP)
杉本建二 (〒4 福岡県北九州市八幡西区黒崎城石１番２号三菱化学エンジニアリング株式会社内 Fukuoka, 806004, JP)
International Classes:
G03F7/30; G03D3/00; G03F7/32; G03F7/30; G03D3/00; G03F7/32
Attorney, Agent or Firm:
OKADA, Kazuhiko (Okada & Associates, 6F Kudan Kangyo Bldg.,10-1, Kudan-kita 1-chome,Chiyoda-ku, Tokyo 73, 1020073, JP)
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