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Title:
METHOD FOR REMOVAL OF NUCLEIC ACID-PROTECTING GROUP
Document Type and Number:
WIPO Patent Application WO/2007/097447
Kind Code:
A1
Abstract:
The object is to provide, in a ribonucleic acid derivative having a substituent represented by the formula (I) which protects a 2'-hydroxyl group in the ribose moiety and silicon protecting groups which protect a 3'-hydroxyl group and a 5'-hydroxyl group in the ribose moiety, a method for removal of the silicon protecting groups from the derivative at low cost, on a large scale, and with good efficiency. (I) wherein WG1 represents an electron-withdrawing group. The method comprises reacting a ribonucleic acid derivative represented by the general formula (1) with a salt between a tertiary amine represented by the general formula (2) and hydrofluoric acid or a mixture of the tertiary amine and hydrofluoric acid to remove silicon protecting groups which protect a 3'-hydroxyl group and a 5'-hydroxyl group in the ribose moiety of the ribonucleic acid derivative, thereby producing a ribonucleic acid derivative represented by the general formula (3).

Inventors:
KITAGAWA HIDETOSHI (JP)
MASUDA HIROFUMI (JP)
Application Number:
PCT/JP2007/053492
Publication Date:
August 30, 2007
Filing Date:
February 26, 2007
Export Citation:
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Assignee:
NIPPON SHINYAKU CO LTD (JP)
KITAGAWA HIDETOSHI (JP)
MASUDA HIROFUMI (JP)
International Classes:
C07H19/067; C07H19/10; C07H19/167; C07H19/20; C07H21/02; C07H21/04
Domestic Patent References:
WO2006022323A12006-03-02
WO2006102970A22006-10-05
WO2005023828A12005-03-17
Other References:
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Attorney, Agent or Firm:
SHIMIZU, Naoto (NIPPON SHINYAKU CO. LTD., 14, Kisshoin Nishinosho Monguchicho, Minami-ku, Kyoto-sh, Kyoto 50, JP)
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