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Title:
METHOD FOR REMOVING CELLS, CELL-SUPPORTING SUBSTRATE, AND METHOD FOR CULTURING CELLS
Document Type and Number:
WIPO Patent Application WO/2015/098919
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing a technique allowing for removal under mild conditions when adherent cells are being removed from a support. In the present invention, in the removal of cells (2) that are adhered to a surface of a substrate (1) serving as a support, where the cells (2) are being removed from the substrate (1), the substrate (1) comprises a photoresponsive gas generator agent that generates gas in response to being irradiated with light, and the cells (2) are removed from the substrate (1) by causing bubbles (7) of gas generated by irradiating the substrate (1) with light to come into contact with the cells (2). According to this method, the cells (2) can be removed and recovered in a nearly-intact state, with little load applied to the surface of the cells (2). It is also possible to remove the cells (2) in a colony state. Also provided is a cell-supporting substrate comprising a photoresponsive gas generator agent.

Inventors:
AKAGI YOSHINORI (JP)
MATSUMOTO SHUICHIRO (JP)
KAGE SHUUJI (JP)
NOMURA SHIGERU (JP)
IZUMOTO YOSHITAKA (JP)
YAMAMURA SHOHEI (JP)
KATAOKA MASATOSHI (JP)
Application Number:
PCT/JP2014/084057
Publication Date:
July 02, 2015
Filing Date:
December 24, 2014
Export Citation:
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Assignee:
SEKISUI CHEMICAL CO LTD (JP)
NAT INST OF ADVANCED IND SCIEN (JP)
International Classes:
C12N1/02; C12M1/00; C12M3/00; C12N5/00
Domestic Patent References:
WO2011058721A12011-05-19
Foreign References:
JP2009045002A2009-03-05
JP2003339373A2003-12-02
JP2010088316A2010-04-22
JP2003342540A2003-12-03
JP2003171623A2003-06-20
JP2003238936A2003-08-27
JPS6330581A1988-02-09
Attorney, Agent or Firm:
FUJITA Takashi et al. (JP)
Takashi Fujita (JP)
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