Title:
METHOD OF REMOVING HARD COATING FILM
Document Type and Number:
WIPO Patent Application WO/2007/116523
Kind Code:
A1
Abstract:
A hard coating film (30) is efficiently etched with a beam of krypton ions, which
have a relatively large mass, in a step (S2) and then slowly etched with a beam of
argon ions, which have a small mass, in a step (S3) as shown in Fig. 3. Thus, film
removal can be carried out in a short time while minimizing influences (shape
change and dimensional change) on the tool base (20). Since krypton and argon
each is an inert gas, chemical corrosion of the tool base (20) and resultant surface
embrittlement are nil even when the surface of the tool base (20) is exposed. When
this tool base (20) is recoated with a hard coating film (30) to produce a regenerated
hard-film-coated processing tool (12), the hard coating film (30) is adherent
thereto at an excellent adhesion strength.
Inventors:
HANYU HIROYUKI (JP)
FUKUI YASUO (JP)
FUKUI YASUO (JP)
Application Number:
PCT/JP2006/307589
Publication Date:
October 18, 2007
Filing Date:
April 10, 2006
Export Citation:
Assignee:
OSG CORP (JP)
HANYU HIROYUKI (JP)
FUKUI YASUO (JP)
HANYU HIROYUKI (JP)
FUKUI YASUO (JP)
International Classes:
B23K15/00; C23C14/06; B23P15/28; C23C14/02; B23K101/20
Foreign References:
| JPH0532424A | 1993-02-09 | |||
| JP2003171785A | 2003-06-20 | |||
| JP2003200350A | 2003-07-15 | |||
| JPH06299373A | 1994-10-25 | |||
| JPH02290243A | 1990-11-30 |
Attorney, Agent or Firm:
IKEDA, Haruyuki (15-1Meieki 3-chome, Nakamura-k, Nagoya-shi Aichi 02, JP)
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