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Patent Searching and Data


Title:
METHOD FOR REMOVING IMPURITIES
Document Type and Number:
WIPO Patent Application WO/2013/077319
Kind Code:
A1
Abstract:
The present invention pertains to a method for removing impurities, the method comprising: providing a first filled layer and a second filled layer that are filled with a filler material and supplying, through a gas supply unit that is located below the first filling layer, a mixed gas containing as an impurity either solid matter or a component capable of forming solid matter by polymerization; distilling in a distillation column and extracting a gas that contains a target matter from a first discharge line; extracting a liquid that contains the impurity from a second discharge line to the exterior of the distillation column; supplying at least some of the extracted liquid to the first filling layer from above as a circulated liquid; rinsing away the impurity captured in the first filling layer by using the circulated liquid as well as a reflux liquid from the top of the distillation column, to obtain a liquid that contains the impurity; and extracting the liquid that contains the impurity through the first discharge line. According to the present invention, it is possible to provide a method for removing impurities whereby solid matter or a component capable of forming solid matter by polymerization can be removed as an impurity from the interior of a distillation column when a target matter is being isolated by distillation in the distillation column.

Inventors:
YOKOTA MASASHI (JP)
KOBAYASHI YOSHINORI (JP)
Application Number:
PCT/JP2012/080062
Publication Date:
May 30, 2013
Filing Date:
November 20, 2012
Export Citation:
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Assignee:
SUMITOMO CHEMICAL CO (JP)
International Classes:
C07D201/16; B01D3/14; B01D3/16; C07D201/04; C07D223/10; C07B61/00
Foreign References:
JPS3811607B1
JP2001019655A2001-01-23
JPH05230015A1993-09-07
JP2007223906A2007-09-06
Attorney, Agent or Firm:
TANAI Sumio et al. (JP)
Sumio Tanai (JP)
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Claims: