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Patent Searching and Data


Title:
METHOD FOR REMOVING IMPURITIES
Document Type and Number:
WIPO Patent Application WO/2018/037504
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a method for removing impurities that makes it possible to efficiently and inexpensively remove impurities such as dust and soot contained in a gas such as exhaust gas. Provided is a method for removing impurities, in which impurities in exhaust gas are removed, the method comprising a step for forming a froth layer A in a tank 1 by blowing the exhaust gas through an exhaust gas dispersion tube 7 into an absorbing solution accommodated within the tank 1, wherein: the gas holdup in the froth layer A is set to 0.4 to 0.9, the gas holdup being the proportion of gas that makes up the froth layer A; the height of the froth layer A is set to 0.2 to 1.8 m; and the gas-liquid contact surface area per unit volume of the froth layer A is set to 1500 to 2500 m2/m3. Due to this configuration, it is possible to efficiently and inexpensively remove impurities such as dust and soot contained in a gas such as exhaust gas.

Inventors:
KAMEDA TAKAO (JP)
TAKEI NOBORU (JP)
KUMAGAI KAZUYA (JP)
KIDO SOSUKE (JP)
UEMURA MASATAKA (JP)
Application Number:
PCT/JP2016/074673
Publication Date:
March 01, 2018
Filing Date:
August 24, 2016
Export Citation:
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Assignee:
CHIYODA CORP (JP)
International Classes:
B01D53/18; B01D47/02; B01D47/04; B01D53/50; B01D53/68; B01D53/78
Foreign References:
JP2013000722A2013-01-07
JPH1190172A1999-04-06
JPH10165801A1998-06-23
JP2014237073A2014-12-18
Attorney, Agent or Firm:
KURIBAYASHI, Mitsuo (JP)
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