Title:
METHOD FOR ROUGHENING SURFACE USING WET TREATMENT
Document Type and Number:
WIPO Patent Application WO/2017/047713
Kind Code:
A1
Abstract:
[Problem] To provide a method for roughening a substrate surface. [Solution] This surface roughening method includes: a first step for applying a composition (a3) that contains inorganic particles (a1) and an organic resin (a2) to the surface of a substrate, and then performing drying and curing to form an organic resin layer (A) on the substrate; and a second step for etching the substrate on which the organic resin layer (A) was formed using a solution that contains hydrogen fluoride, hydrogen peroxide, or an acid, whereby the surface of the substrate is roughened. In a particularly preferred embodiment: the etching is performed using a solution that contains hydrogen fluoride and ammonium fluoride, or hydrogen peroxide and ammonium; the organic resin layer (A) contains inorganic particles (a1) in a proportion of 5-50 parts by mass in relation to 100 parts by mass of the organic resin (a2); and a mixture comprising a solution of the organic resin (a2) and a silica sol or a titanium oxide sol in which silica or titanium oxide is dispersed as the inorganic particles (a1) in an organic solvent is used as the composition (a3). The present method is applicable to a light-extraction layer of an LED, or to a low-reflection glass for a solar cell.
Inventors:
HASHIMOTO KEISUKE (JP)
SOMEYA YASUNOBU (JP)
KISHIOKA TAKAHIRO (JP)
SAKAMOTO RIKIMARU (JP)
SOMEYA YASUNOBU (JP)
KISHIOKA TAKAHIRO (JP)
SAKAMOTO RIKIMARU (JP)
Application Number:
PCT/JP2016/077324
Publication Date:
March 23, 2017
Filing Date:
September 15, 2016
Export Citation:
Assignee:
NISSAN CHEMICAL IND LTD (JP)
International Classes:
H01L21/306; C03C15/00; H01L33/22; H01L51/50; H05B33/02; H05B33/10
Foreign References:
| JP2010074004A | 2010-04-02 | |||
| JP2011086762A | 2011-04-28 | |||
| JP2007201459A | 2007-08-09 |
Attorney, Agent or Firm:
HANABUSA PATENT & TRADEMARK OFFICE (JP)
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