Title:
METHOD FOR SETTING INSPECTION CONDITIONS FOR X-RAY INSPECTION APPARATUS
Document Type and Number:
WIPO Patent Application WO/2019/016855
Kind Code:
A1
Abstract:
The present invention provides a method for setting inspection conditions for an X-ray inspection apparatus, with which it is possible to obtain stable inspection accuracy regardless of temporal variation or machine differences. This inspection condition setting method is intended for an X-ray inspection apparatus provided with an X-ray source, a detector for detecting an X-ray from a specimen, a stage for moving the specimen relative to the X-ray source and the detector, and a second standard specimen fixed to the stage, the method comprising: a step for storing, in a storage device, X-ray source adjustment target values determined on the basis of an X-ray transmission image of a first standard specimen; and a step for making adjustments between inspections, using an X-ray transmission image of the second standard specimen, to operational conditions so as to make the conditions to substantially coincide with the target values, wherein the target values include a contrast value and a noise value of the X-ray transmission image of the second specimen.
Inventors:
HATTORI TATSUMI (JP)
SASAZAWA HIDEAKI (JP)
NAKANO YASUNORI (JP)
AOKI YASUKO (JP)
SASAZAWA HIDEAKI (JP)
NAKANO YASUNORI (JP)
AOKI YASUKO (JP)
Application Number:
PCT/JP2017/025924
Publication Date:
January 24, 2019
Filing Date:
July 18, 2017
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
G01N23/04
Domestic Patent References:
| WO2017017745A1 | 2017-02-02 |
Foreign References:
| JP2003329430A | 2003-11-19 | |||
| JP2004012459A | 2004-01-15 | |||
| JP2004170226A | 2004-06-17 | |||
| JP2013185960A | 2013-09-19 | |||
| JP2010054201A | 2010-03-11 | |||
| JP2009543083A | 2009-12-03 |
Attorney, Agent or Firm:
KAICHI IP (JP)
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