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Patent Searching and Data


Title:
METHOD AND SYSTEM FOR REMOVING BIOFILM BY USING HIGH POWER MILLIMETER WAVES
Document Type and Number:
WIPO Patent Application WO/2017/105062
Kind Code:
A1
Abstract:
The present invention presents a method and a system for removing a biofilm by using high power millimeter waves. According to a preferred embodiment of the present invention, the system for removing a biofilm emits a high power millimeter wave beam at an object such that the wave beam penetrates within hundreds of micrometers from the surface of the object, thereby removing a biofilm. The system for removing a biofilm by using high power millimeter waves, of the present invention, comprises: a millimeter wave emission apparatus; a guiding device for reflecting the millimeter waves, which are outputted from the millimeter wave emission apparatus, so as to output the same toward an object having a biofilm formed thereon; a transfer device for moving and rotating the object; and a control device for controlling the guide direction of the guiding device and controlling the transfer device.

Inventors:
HAN, Seong Tae (308-701, Purgio 3 Danji Apt. 57, Yulha 2-ro,,Gimhae-si, Gyeongsangnam-do, 51019, KR)
Application Number:
KR2016/014601
Publication Date:
June 22, 2017
Filing Date:
December 13, 2016
Export Citation:
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Assignee:
KOREA ELECTROTECHNOLOGY RESEARCH INSTITUTE (12 Bulmosan-ro 10beon-gil, Seongsan-gu, Changwon-si, Gyeongsangnam-do, 51543, KR)
International Classes:
A23L3/26; A23B4/01; A23B4/015; A23L3/005
Foreign References:
JP5391199B22014-01-15
CN103960218A2014-08-06
JPS63131701A1988-06-03
JPH05150127A1993-06-18
JP2007215408A2007-08-30
Attorney, Agent or Firm:
B&IP-JOOWON PATENT AND LAW FIRM (9th Floor, Construction Center Eonju-ro 711,,Gangnam-gu, Seoul, 06050, KR)
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