Title:
METHOD FOR TEXTURING SEMICONDUCTOR SUBSTRATE, SEMICONDUCTOR SUBSTRATE MANUFACTURED BY SAME METHOD AND SOLAR CELL COMPRISING SAME SEMICONDUCTOR SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2019/054555
Kind Code:
A1
Abstract:
Disclosed are a method for texturing a semiconductor substrate, a semiconductor substrate manufactured by the method, and a solar cell comprising the semiconductor substrate. One embodiment of the present invention provides a method for texturing a semiconductor substrate, comprising: a metal nanoparticle forming step of forming a metal nanoparticle on a semiconductor substrate; a first etching step of etching the semiconductor substrate; a metal nanoparticle removing step of removing the metal nanoparticle; and a second etching step of etching the semiconductor substrate etched in the first etching step to form a nanostructure.
Inventors:
LEE DOH KWON (KR)
KIM IN HO (KR)
KIM WON MOK (KR)
PARK JONG KEUK (KR)
LEE TAEK SUNG (KR)
JEONG DOO SEOK (KR)
LEE HYEON SEUNG (KR)
JEONG JEUNG HYUN (KR)
KIM IN HO (KR)
KIM WON MOK (KR)
PARK JONG KEUK (KR)
LEE TAEK SUNG (KR)
JEONG DOO SEOK (KR)
LEE HYEON SEUNG (KR)
JEONG JEUNG HYUN (KR)
Application Number:
PCT/KR2017/012212
Publication Date:
March 21, 2019
Filing Date:
November 01, 2017
Export Citation:
Assignee:
KOREA INST SCI & TECH (KR)
International Classes:
H01L31/0236; H01L21/02; H01L21/027; H01L21/311; H01L31/18
Foreign References:
| JP2017504179A | 2017-02-02 | |||
| KR20160146126A | 2016-12-21 | |||
| KR20170024450A | 2017-03-07 | |||
| KR20100032663A | 2010-03-26 | |||
| KR101372413B1 | 2014-03-10 |
Attorney, Agent or Firm:
TNI IP LAW FIRM (KR)
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