Title:
METHOD TO ISOLATE MULTI ZONE HEATER FROM ATMOSPHERE
Document Type and Number:
WIPO Patent Application WO2002005321
Kind Code:
A3
Abstract:
A wafer processing method, comprising processing the wafer in a reaction chamber comprising a heater having an interior volume; heating the reaction chamber with the heater, purging an inert gas into the heater interior volume, and venting the inert gas.
Inventors:
HO HENRY
Application Number:
PCT/US2001/020095
Publication Date:
June 06, 2002
Filing Date:
June 22, 2001
Export Citation:
Assignee:
APPLIED MATERIALS INC (US)
International Classes:
C23C16/458; C23C16/46; H01L21/205; (IPC1-7): C23C16/46; C23C16/458
Foreign References:
| US5994678A | 1999-11-30 | |||
| US3536892A | 1970-10-27 | |||
| US5094885A | 1992-03-10 | |||
| US4777022A | 1988-10-11 |
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