Title:
METHOD FOR WASHING MASK FOR VACUUM VAPOR DEPOSITION AND RINSING COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2019/003605
Kind Code:
A1
Abstract:
Provided is a method for washing a mask for vacuum vapor deposition, the method comprising washing a mask by using a washing composition that contains at least one selected from N-methyl-2-pyrrolidinone and N,N-dimethylformamide, and then rinsing the washed mask by using a rinsing composition containing at least one type of a hydro fluoro ether selected from among HFE-347pc-f, HFE-254pc, HFE-356pcf, and HFE-449mec-f. According to this washing method, when rinsing off the washing composition during washing of the mask that has been used in a vacuum vapor deposition process in the manufacturing of an organic EL element, it is possible to wash the mask so as to be extremely clean without resulting in decomposition of an active ingredient.
Inventors:
MIKI TOSHIO (JP)
HANADA TSUYOSHI (JP)
HANADA TSUYOSHI (JP)
Application Number:
PCT/JP2018/016296
Publication Date:
January 03, 2019
Filing Date:
April 20, 2018
Export Citation:
Assignee:
AGC INC (JP)
International Classes:
C23C14/04; C11D7/28; C11D7/50; C23C14/00; H01L51/50; H05B33/10
Domestic Patent References:
| WO2005001015A1 | 2005-01-06 | |||
| WO2005026309A1 | 2005-03-24 |
Foreign References:
| JP2009259565A | 2009-11-05 | |||
| JP2008106289A | 2008-05-08 | |||
| JP2006117811A | 2006-05-11 | |||
| JPH08245469A | 1996-09-24 | |||
| JP2002180280A | 2002-06-26 | |||
| JP2005162947A | 2005-06-23 |
Attorney, Agent or Firm:
SAKURA PATENT OFFICE, P.C. (JP)
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