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Patent Searching and Data


Title:
METHOD OF WASHING PIPE OF LIGHT-EMISSION MEASURING DEVICE AND MECHANISM FOR WASHING PIPE OF LIGHT-EMISSION MEASURING DEVICE
Document Type and Number:
WIPO Patent Application WO/2011/093218
Kind Code:
A1
Abstract:
Disclosed is a pipe washing means capable of effectively suppressing introduction of viable cells into a device and contamination occurring inside the device. Also disclosed are a method and a mechanism for washing pipes of a light-emission measuring device. Specifically, a method of washing pipes of a light-emission measuring device (10) comprises a lysing step of sterilizing the inside of a supply pipe of the light-emission measuring device (10) for supplying hot water or reagents by supplying a sterilizing reagent to the supply pipe; an ATP removing step of removing ATP inside the supply pipe by supplying an ATP eliminating reagent to the supply pipe after the sterilization of the inside of the supply pipe; and a step of replacing the ATP eliminating reagent inside the supply pipe with pure water.

Inventors:
MIYASHITA, Noe (Ltd. 5-2 Higashi-Ikebukuro 4-chome, Toshima-k, Tokyo 66, 〒1708466, JP)
Application Number:
JP2011/051068
Publication Date:
August 04, 2011
Filing Date:
January 21, 2011
Export Citation:
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Assignee:
Hitachi Plant Technologies, Ltd. (5-2 Higashi-Ikebukuro 4-chome, Toshima-ku Tokyo, 66, 〒1708466, JP)
株式会社日立プラントテクノロジー (〒66 東京都豊島区東池袋4丁目5番2号 Tokyo, 〒1708466, JP)
International Classes:
G01N21/76; B08B9/02; C12M1/34; A61L2/18; G01N1/00; G01N35/10
Attorney, Agent or Firm:
MURAKAMI, Tomokazu (9th Floor, COI Minami-Ikebukuro Bldg. 27-17, Minami-Ikebukuro 2-chome, Toshima-k, Tokyo 22, 〒1710022, JP)
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Claims: