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Title:
METHODS AND APPARATUS FOR CLEANING SUBSTRATES
Document Type and Number:
WIPO Patent Application WO/2019/144273
Kind Code:
A1
Abstract:
A method and an apparatus for cleaning a substrate are provided. The substrate (1010) comprises features (4034) of patterned structures. The method comprises placing the substrate on a substrate holder (1014) configured to rotate the substrate; applying cleaning liquid (1032) on the substrate; rotating the substrate by the substrate holder at a first rate when acoustic energy is being applied to the cleaning liquid by a transducer (1004); and rotating the substrate by the substrate holder at a second rate higher than the first rate when acoustic energy is not being applied to the cleaning liquid by the transducer.

Inventors:
WANG, Hui (Bld. 4, No. 1690 Cailun Road Zhangjiang High-tech Park, Shanghai 3, 201203, CN)
WANG, Xi (Bld. 4, No. 1690 Cailun Road Zhangjiang High-tech Park, Shanghai 3, 201203, CN)
ZHANG, Xiaoyan (Bld. 4, No. 1690 Cailun Road Zhangjiang High-tech Park, Shanghai 3, 201203, CN)
CHEN, Fufa (Bld. 4, No. 1690 Cailun Road Zhangjiang High-tech Park, Shanghai 3, 201203, CN)
CHEN, Fuping (Bld. 4, No. 1690 Cailun Road Zhangjiang High-tech Park, Shanghai 3, 201203, CN)
Application Number:
CN2018/073810
Publication Date:
August 01, 2019
Filing Date:
January 23, 2018
Export Citation:
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Assignee:
ACM RESEARCH (SHANGHAI) INC. (Bld. 4, No. 1690 Cailun Road Zhangjiang High-tech Park, Shanghai 3, 201203, CN)
International Classes:
H01L21/66; B08B3/12; H01L21/02; H01L21/76
Domestic Patent References:
WO2016183707A12016-11-24
WO2017173588A12017-10-12
Foreign References:
CN105655241A2016-06-08
CN102197462A2011-09-21
CN101419903A2009-04-29
Attorney, Agent or Firm:
SHANGHAI PATENT & TRADEMARK LAW OFFICE, LLC (435 Guiping Road, Shanghai 3, 200233, CN)
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