Title:
METHODS AND APPARATUS FOR CONTROLLING AN AMOUNT OF A CHEMICAL CONSTITUENT OF AN ELECTROCHEMICAL BATH
Document Type and Number:
WIPO Patent Application WO2003006715
Kind Code:
A9
Abstract:
An automated chemical management system (100) for managing the chemicalcontent of an electrochemical bath used to deposit a material on the surface of a microelectronic workpiece is set forth. The automated chemical management system includes a dosing system that is adapted to dose an amount of one or more chemicals to replenish a given electrochemical bath constituent in accordance with a predetermined dosing equation. The chemical management system also includes an analytical measurement system (122) that is adapted to provide a measurement result indicative of the amount of the given constituent in the electrochemical bath at predetermined time intervals. The chemical management system uses the measurements results to modify the dosing equation of the dosing system. In this manner, the replenishment operations executed by the chemical management system are effetively refined over time thereby providing more accurate control of the amount of the target contituent in the electrochemical bath.
Inventors:
FULTON DAKIN (US)
RITZDORF THOMAS L (US)
RITZDORF THOMAS L (US)
Application Number:
PCT/US2002/021723
Publication Date:
May 13, 2004
Filing Date:
July 08, 2002
Export Citation:
Assignee:
SEMITOOL INC (US)
FULTON DAKIN (US)
RITZDORF THOMAS L (US)
FULTON DAKIN (US)
RITZDORF THOMAS L (US)
International Classes:
C25D21/14; G05D11/13; (IPC1-7): C25B15/00
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