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Patent Searching and Data


Title:
METHODS AND APPARATUS FOR PLASMA PROCESSING CONTROL
Document Type and Number:
WIPO Patent Application WO2003096382
Kind Code:
A3
Abstract:
Apparatus and methods for plasma-process control are provided. One method relates to determining a physical condition of at least one object in a cavity (12) containing gas, where sufficient electromagnetic radiation is directed into the cavity (120) to maintain (e.g., modulate or sustain) a plasma from the gas. The method can further include monitoring a temperature of the at least one object and detecting a spike in the temperature.

Inventors:
KUMAR SATYENDRA (US)
KUMAR DEVENDRA (US)
Application Number:
US0314135W
Publication Date:
July 15, 2004
Filing Date:
May 07, 2003
Export Citation:
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Assignee:
DANA CORPORATION
KUMAR, SATYENDRA
KUMAR, DEVENDRA
International Classes:
B01J7/00; A62D3/00; B01D53/86; B01D53/92; B01J19/08; B01J19/12; B01J37/34; B22F3/105; C01B3/02; C21D1/06; C21D1/09; C21D1/38; F01N3/08; F01N3/10; F01N3/20; F01N3/24; F01N3/28; F01N3/30; F01N9/00; F27B17/00; F27D3/12; F27D11/08; F27D11/12; G21K5/00; H01J37/32; H01M8/06; H05B6/68; H05B6/78; H05B6/80; H05H1/24; H05H1/46; C22B4/00; F01N13/10; (IPC1-7): B23K10/00
Foreign References:
US20020197882A12002-12-26
US6348158B12002-02-19
EP0435591A21991-07-03
JPH08217558A1996-08-27
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