Title:
METHODS OF FORMING ALPHA AND BETA TANTALUM FILMS WITH CONTROLLED AND NEW MICROSTRUCTURES
Document Type and Number:
WIPO Patent Application WO2005095263
Kind Code:
A3
Abstract:
Thin tantalum films having novel microstructures are provided. The films have microstructures such as nanocrystalline, single crystal and amorphous. These films provide excellent diffusion barrier properties and are useful in microelectronic devices. Methods of forming the films using pulsed laser deposition (PLD) and molecular beam epitaxy (MBE) deposition methods are also provided, as are microelectronic devices incorporating these films.
Inventors:
NARAYAN JAGDISH (US)
KUMAR PRABHAT (US)
WU RICHARD (US)
KUMAR PRABHAT (US)
WU RICHARD (US)
Application Number:
PCT/US2005/009763
Publication Date:
May 11, 2006
Filing Date:
March 24, 2005
Export Citation:
Assignee:
STARCK H C INC (US)
NARAYAN JAGDISH (US)
KUMAR PRABHAT (US)
WU RICHARD (US)
NARAYAN JAGDISH (US)
KUMAR PRABHAT (US)
WU RICHARD (US)
International Classes:
B81C1/00; C23C14/16; C23C14/54; C23C16/06; C30B23/00; C30B25/00; C30B29/02
Domestic Patent References:
| WO1998054377A2 | 1998-12-03 |
Other References:
GE S H ET AL: "Structures and magnetic properties of Co/Ta multilayered thin films", PHYSICA STATUS SOLIDI A GERMANY, vol. 132, no. 2, 16 August 1992 (1992-08-16), pages 487 - 493, XP009052667, ISSN: 0031-8965
PARFITT L J ET AL: "ORIGINS OF RESIDUAL STRESS IN MO AND TA FILMS: THE ROLE OF IMPURITIES, MICROSTRUCTURAL EVOLUTION AND PHASE TRANSFORMATIONS", MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS, MATERIALS RESEARCH SOCIETY, PITTSBURG, PA, US, vol. 436, 8 April 1996 (1996-04-08), pages 505 - 510, XP002074085, ISSN: 0272-9172
FRENCH B L ET AL: "Correlation of stress and phase evolution in thin Ta films on Si (100) during thermal testing", SURFACE ENGINEERING 2002 - SYNTHESIS, CHARACTERIZATION AND APPLICATIONS. SYMPOSIUM (MATER. RES. SOC. SYMPOSIUM PROCEEDINGS VOL.750) MATER. RES. SOC WARRENDALE, PA, USA, 2003, pages 367 - 372, XP002341641, ISBN: 1-55899-687-7
HOOGEVEEN R ET AL: "TEXTURE AND PHASE TRANSFORMATION OF SPUTTER-DEPOSITED METASTABLE TAFILMS AND TA/CU MULTILAYERS", THIN SOLID FILMS, ELSEVIER-SEQUOIA S.A. LAUSANNE, CH, vol. 275, no. 1/2, 1 April 1996 (1996-04-01), pages 203 - 206, XP000626342, ISSN: 0040-6090
KIM H ET AL: "THE GROWTH OF TANTALUM THIN FILMS BY PLASMA-ENHANCED ATOMIC LAYER DEPOSITION AND DIFFUSION BARRIER PROPERTIES", MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS, MATERIALS RESEARCH SOCIETY, PITTSBURG, PA, US, vol. 716, 2002, pages 407 - 412, XP008026978, ISSN: 0272-9172
PINTO R ET AL: "GETTER-BIAS SPUTTERING OF HIGH PURITY METAL FILMS IN A HIGH CURRENT VACUUM DISCHARGE IN THE 10-4 TORR RANGE", JAPANESE JOURNAL OF APPLIED PHYSICS, PUBLICATION OFFICE JAPANESE JOURNAL OF APPLIED PHYSICS. TOKYO, JP, vol. 9, no. 2, February 1970 (1970-02-01), pages 174 - 181, XP000861704, ISSN: 0021-4922
LEE S L ET AL: "Texture, structure and phase transformation in sputter beta tantalum coating", SURFACE AND COATINGS TECHNOLOGY, ELSEVIER, vol. 177-178, 30 January 2004 (2004-01-30), pages 44 - 51, XP002341669, ISSN: 0257-8972, Retrieved from the Internet
"METHOD FOR CONTROLLING THE CRYSTALLINE PHASE OF TANTALUM", IBM TECHNICAL DISCLOSURE BULLETIN, IBM CORP. NEW YORK, US, vol. 32, no. 5A, 1 October 1989 (1989-10-01), pages 42 - 43, XP000048830, ISSN: 0018-8689
PARFITT L J ET AL: "ORIGINS OF RESIDUAL STRESS IN MO AND TA FILMS: THE ROLE OF IMPURITIES, MICROSTRUCTURAL EVOLUTION AND PHASE TRANSFORMATIONS", MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS, MATERIALS RESEARCH SOCIETY, PITTSBURG, PA, US, vol. 436, 8 April 1996 (1996-04-08), pages 505 - 510, XP002074085, ISSN: 0272-9172
FRENCH B L ET AL: "Correlation of stress and phase evolution in thin Ta films on Si (100) during thermal testing", SURFACE ENGINEERING 2002 - SYNTHESIS, CHARACTERIZATION AND APPLICATIONS. SYMPOSIUM (MATER. RES. SOC. SYMPOSIUM PROCEEDINGS VOL.750) MATER. RES. SOC WARRENDALE, PA, USA, 2003, pages 367 - 372, XP002341641, ISBN: 1-55899-687-7
HOOGEVEEN R ET AL: "TEXTURE AND PHASE TRANSFORMATION OF SPUTTER-DEPOSITED METASTABLE TAFILMS AND TA/CU MULTILAYERS", THIN SOLID FILMS, ELSEVIER-SEQUOIA S.A. LAUSANNE, CH, vol. 275, no. 1/2, 1 April 1996 (1996-04-01), pages 203 - 206, XP000626342, ISSN: 0040-6090
KIM H ET AL: "THE GROWTH OF TANTALUM THIN FILMS BY PLASMA-ENHANCED ATOMIC LAYER DEPOSITION AND DIFFUSION BARRIER PROPERTIES", MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS, MATERIALS RESEARCH SOCIETY, PITTSBURG, PA, US, vol. 716, 2002, pages 407 - 412, XP008026978, ISSN: 0272-9172
PINTO R ET AL: "GETTER-BIAS SPUTTERING OF HIGH PURITY METAL FILMS IN A HIGH CURRENT VACUUM DISCHARGE IN THE 10-4 TORR RANGE", JAPANESE JOURNAL OF APPLIED PHYSICS, PUBLICATION OFFICE JAPANESE JOURNAL OF APPLIED PHYSICS. TOKYO, JP, vol. 9, no. 2, February 1970 (1970-02-01), pages 174 - 181, XP000861704, ISSN: 0021-4922
LEE S L ET AL: "Texture, structure and phase transformation in sputter beta tantalum coating", SURFACE AND COATINGS TECHNOLOGY, ELSEVIER, vol. 177-178, 30 January 2004 (2004-01-30), pages 44 - 51, XP002341669, ISSN: 0257-8972, Retrieved from the Internet
"METHOD FOR CONTROLLING THE CRYSTALLINE PHASE OF TANTALUM", IBM TECHNICAL DISCLOSURE BULLETIN, IBM CORP. NEW YORK, US, vol. 32, no. 5A, 1 October 1989 (1989-10-01), pages 42 - 43, XP000048830, ISSN: 0018-8689
Download PDF:
Previous Patent: MICROCHIP AND METHOD FOR DETECTING MOLECULES AND MOLECULAR INTERACTIONS
Next Patent: METHOD AND DEVICE FOR THE GENERATION OF HYDROGEN
Next Patent: METHOD AND DEVICE FOR THE GENERATION OF HYDROGEN