Title:
METHODS OF FORMING SPUTTERING TARGETS
Document Type and Number:
WIPO Patent Application WO2002061168
Kind Code:
B1
Abstract:
The invention encompasses methods of forming titanium-based mixed-metal materials and zirconium-based mixed-metal materials utilizing one or more of a reduction process, electrolysis process and iodide process. The invention also encompasses a sputtering target comprising zirconium and one or more elements selected from the group consisting of Al, B, Ba, Be, Ca, Ce, Co, Cs, Dy, Er, Fe, Gd, Hf, Ho, La, Mg, Mn, Mo, Nb, Ni, Pr, Sc, Sm, Sr, Ta, Ti, V, W, Y, and Yb. The invention also encompasses a sputtering target comprising titanium and boron.
Inventors:
TURNER STEPHEN P
GREEN JOSEPH E
SCAGLINE RODNEY L
XU YUN
GREEN JOSEPH E
SCAGLINE RODNEY L
XU YUN
Application Number:
PCT/US2001/050645
Publication Date:
June 26, 2003
Filing Date:
October 17, 2001
Export Citation:
Assignee:
HONEYWELL INT INC (US)
International Classes:
C22B5/12; C22B34/12; C22B34/14; C22C14/00; C22C16/00; C23C14/34; C22B5/04; C25C3/26; (IPC1-7): C23C14/34; C23C16/08; C22B34/00; C22C27/00; C22B34/12; C22B34/14
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