Title:
METHODS OF MAKING AN ANTISTATIC AGENT
Document Type and Number:
WIPO Patent Application WO2006052522
Kind Code:
A3
Abstract:
Disclosed are methods for making the phosphonium sulfonate salt of generic formula: (1): wherein each X is independently a halogen or hydrogen, provided that the molar ratio of halogen to hydrogen is greater than about 0.90; p is 0 or 1 and q and r are integers of 0 to about 7 provided that q+r is less than 8 and that if p is 1 then r is greater than zero; and each R is the same or different hydrocarbon radical containing 1 to about 18 carbon, atoms, the method comprising the steps of combining in an aqueous medium, a compound of the generic formula: (2): wherein M is K, and X, q, p, and r are as defined above, with a compound of the generic formula: (3): (R)4P-Z wherein Z is a halogen and R is as defined above; and separating the phosphonium sulfonate of formula (1) from the aqueous medium. Also disclosed is an antistatic composition comprising phosphonium sulfonate (1), and articles prepared therefrom.
Inventors:
HOEKS THEODORUS LAMBERTUS (NL)
LEENDERS CHIEL ALBERTUS (NL)
VAN DE GRAMPEL ROBERT DIRK (NL)
LEENDERS CHIEL ALBERTUS (NL)
VAN DE GRAMPEL ROBERT DIRK (NL)
Application Number:
PCT/US2005/039369
Publication Date:
August 31, 2006
Filing Date:
October 31, 2005
Export Citation:
Assignee:
GEN ELECTRIC (US)
HOEKS THEODORUS LAMBERTUS (NL)
LEENDERS CHIEL ALBERTUS (NL)
VAN DE GRAMPEL ROBERT DIRK (NL)
HOEKS THEODORUS LAMBERTUS (NL)
LEENDERS CHIEL ALBERTUS (NL)
VAN DE GRAMPEL ROBERT DIRK (NL)
International Classes:
C07C303/32; C08K5/00; C07C309/06; C07F9/54
Domestic Patent References:
WO2005100307A2 | 2005-10-27 |
Foreign References:
EP1528082A1 | 2005-05-04 | |||
EP1462438A1 | 2004-09-29 | |||
US6194497B1 | 2001-02-27 | |||
US4943380A | 1990-07-24 | |||
US2732398A | 1956-01-24 |
Other References:
GRAMSTAD T ET AL: "Perfluoroalkyl derivatives of sulphur. Part VI. Perfluoroalkanesulphonic acids CF3.[CF2]n.SO3H (n= 1?7)", JOURNAL OF THE CHEMICAL SOCIETY, 1957, pages 2640 - 2645, XP009066023, ISSN: 0368-1769
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