Title:
METHODS FOR PRODUCING TRANSPARENT ELECTROCONDUCTIVE FILM AND TRANSPARENT ELECTROCONDUCTIVE PATTERN
Document Type and Number:
WIPO Patent Application WO/2018/131702
Kind Code:
A1
Abstract:
[Problem] To provide methods for producing a transparent electroconductive film and transparent electroconductive pattern having superior in-plane uniformity of resistance, by a method of slit coating printing or roll coating printing of metal nanowire ink. [Solution] The invention is characterized by comprising a step in which a metal nanowire ink containing metal nanowires, a binder resin containing more than 50 mol% monomer units derived from N-vinylacetamide, and a solvent is applied to and dried on at least one surface of a transparent resin film to form a transparent electroconductive membrane, the application of the metal nanowire ink to the transparent resin film being application by slit coating or roll coating performed using a transparent resin film and metal nanowire ink with which the advancing angle (θa) of the dynamic contact angle of the metal nanowire ink relative to the transparent resin film satisfies 10.0° <θa ≤ 25.0°, and the difference (θa－θr) between the advancing angle (θa) and the receding angle (θr) is 10.0° or higher.
Inventors:
YAMAKI SHIGERU (JP)
Application Number:
PCT/JP2018/000780
Publication Date:
July 19, 2018
Filing Date:
January 15, 2018
Export Citation:
Assignee:
SHOWA DENKO KK (JP)
International Classes:
H01B13/00; B05D5/12; B05D7/04; B32B27/18; C09D11/52
Foreign References:
| JP2006212477A | 2006-08-17 | |||
| JP2008510597A | 2008-04-10 |
Attorney, Agent or Firm:
ARIHARA Motoji (JP)
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