Title:
METHODS AND SYSTEMS FOR PREVENTING FEATURE COLLAPSE DURING MICROELECTRONIC TOPOGRAPHY FABRICATION
Document Type and Number:
WIPO Patent Application WO/2010/036575
Kind Code:
A3
Abstract:
Methods and systems for preventing feature collapse subsequent to etching include adding a rinse liquid to a microelectronic topography having remnants of another rinse liquid arranged upon its surface and subsequently exposing the topography to a pressurized chamber including a fluid at or greater than critical pressure. The methods include flushing from the pressurized chamber liquid arranged upon the topography and, thereafter, venting the chamber in a manner sufficient to prevent liquid formation therein.
Inventors:
WAGNER MARK I (US)
DEYOUNG JAMES P (US)
KROEKER TONY R (US)
DEYOUNG JAMES P (US)
KROEKER TONY R (US)
Application Number:
PCT/US2009/057490
Publication Date:
June 03, 2010
Filing Date:
September 18, 2009
Export Citation:
Assignee:
LAM RES CORP (US)
WAGNER MARK I (US)
DEYOUNG JAMES P (US)
KROEKER TONY R (US)
WAGNER MARK I (US)
DEYOUNG JAMES P (US)
KROEKER TONY R (US)
International Classes:
H01L21/302
Foreign References:
| US6558475B1 | 2003-05-06 | |||
| US6576066B1 | 2003-06-10 | |||
| US6641678B2 | 2003-11-04 |
Attorney, Agent or Firm:
SCOTT, Mark, E. et al. (P.C.P. O. Box 326, Houston TX, US)
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