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Title:
MICROBE ACCUMULATION METHOD AND ACCUMULATION SYSTEM
Document Type and Number:
WIPO Patent Application WO/2023/210798
Kind Code:
A1
Abstract:
This microbe accumulation method includes first to third steps for accumulating a plurality of types of microbes. The first step is a step for readying an accumulation substrate (13) provided with a plurality of pores (131). Each of the plurality of pores (131) has an opening capable of capturing, for each of the plurality of types of microbes, at least one microbe of each respective type, and a depth extending in a direction including a vertically downward component. The second step is a step for setting a laser light radiation condition. The third step is a step for radiating laser light, through a sample, onto the plurality of pores (131) in accordance with the radiation condition. The region irradiated with the laser light does not include a photothermal conversion material. The step for performing setting includes a step for setting the intensity of non-resonant light in a non-resonant-light irradiation range such that the magnitude of a vertically downward component of a light-induced force produced by irradiation of the non-resonant light is greater than the magnitude of a vertically upward component of a buoyancy force due to a liquid sample and also greater than the magnitude of a vertically upward component of a force produced by Brownian motion of molecules in the liquid sample.

Inventors:
TOKONAMI SHIHO (JP)
IIDA TAKUYA (JP)
Application Number:
PCT/JP2023/016809
Publication Date:
November 02, 2023
Filing Date:
April 28, 2023
Export Citation:
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Assignee:
UNIV OSAKA PUBLIC CORP (JP)
International Classes:
G01N1/04; B01D43/00; C12M1/26; C12M1/34; G01N33/48
Domestic Patent References:
WO2021040021A12021-03-04
WO2006126487A12006-11-30
WO2014192937A12014-12-04
WO2015170758A12015-11-12
WO2009016842A12009-02-05
Foreign References:
JPH0466873A1992-03-03
JP2018194550A2018-12-06
JP2004354345A2004-12-16
JP2006262825A2006-10-05
JP2006094783A2006-04-13
Attorney, Agent or Firm:
FUKAMI PATENT OFFICE, P.C. (JP)
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